Karl Schumacher

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for carrying out a double or multiple exposure
- Patent number 7,310,129
- Issue date Dec 18, 2007
- Infineon Technologies, AG
- Jens Stäcker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing light path uniformity in inspection systems
- Patent number 7,248,351
- Issue date Jul 24, 2007
- Infineon Technologies AG
- William Roberts
- G01 - MEASURING TESTING
Information Patent Grant
Method for controlling a processing device for a sequential process...
- Patent number 6,684,124
- Issue date Jan 27, 2004
- Infineon Technologies AG
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Wafer exposure device and method
- Publication number 20080079920
- Publication date Apr 3, 2008
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimizing focal plane fitting functions for an image field on a su...
- Publication number 20060192943
- Publication date Aug 31, 2006
- William Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for analyzing images of blazed phase grating samples
- Publication number 20060193531
- Publication date Aug 31, 2006
- William Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Run to run control for lens aberrations
- Publication number 20060194130
- Publication date Aug 31, 2006
- William Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimizing light path uniformity in inspection systems
- Publication number 20060192947
- Publication date Aug 31, 2006
- William Roberts
- G01 - MEASURING TESTING
Information Patent Application
Method for carrying out a double or multiple exposure
- Publication number 20050105073
- Publication date May 19, 2005
- Jens Stacker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Configuration and method for detecting defects on a substrate in a...
- Publication number 20040117055
- Publication date Jun 17, 2004
- Torsten Seidel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for controlling a process appliance for the sequential proce...
- Publication number 20020183879
- Publication date Dec 5, 2002
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS

Karl Schumacher

Person

Patents Grantslast 30 patents

Method for carrying out a double or multiple exposure

Optimizing light path uniformity in inspection systems

Method for controlling a processing device for a sequential process...

Patents Applicationslast 30 patents

Wafer exposure device and method

Optimizing focal plane fitting functions for an image field on a su...

System for analyzing images of blazed phase grating samples

Run to run control for lens aberrations

Optimizing light path uniformity in inspection systems

Method for carrying out a double or multiple exposure

Configuration and method for detecting defects on a substrate in a...

Method for controlling a process appliance for the sequential proce...