Karthik Colinjivadi

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metal-containing passivation for high aspect ratio etch
- Patent number 11,670,516
- Issue date Jun 6, 2023
- Lam Research Corporation
- Karthik S. Colinjivadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal doped carbon based hard mask removal in semiconductor fabrica...
- Patent number 11,062,897
- Issue date Jul 13, 2021
- Lam Research Corporation
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma etchback process for advanced metallization app...
- Patent number 8,431,033
- Issue date Apr 30, 2013
- Novellus Systems, Inc.
- Chunming Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...
- Publication number 20220199417
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Jon HENRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-CONTAINING PASSIVATION FOR HIGH ASPECT RATIO ETCH
- Publication number 20210242032
- Publication date Aug 5, 2021
- LAM RESEARCH CORPORATION
- Karthik S. COLINJIVADI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...
- Publication number 20180358220
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Yongsik Yu
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLA...
- Publication number 20120228125
- Publication date Sep 13, 2012
- Liqi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY PLASMA ETCHBACK PROCESS FOR ADVANCED METALLIZATION APP...
- Publication number 20120152896
- Publication date Jun 21, 2012
- Chunming Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLA...
- Publication number 20120070589
- Publication date Mar 22, 2012
- Liqi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Karthik Colinjivadi

Person

Patents Grantslast 30 patents

Metal-containing passivation for high aspect ratio etch

Metal doped carbon based hard mask removal in semiconductor fabrica...

High density plasma etchback process for advanced metallization app...

Patents Applicationslast 30 patents

CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...

METAL-CONTAINING PASSIVATION FOR HIGH ASPECT RATIO ETCH

METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...

CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLA...

HIGH DENSITY PLASMA ETCHBACK PROCESS FOR ADVANCED METALLIZATION APP...

CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLA...