Kartik Santhanam

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhanced process and hardware architecture to detect and correct re...
- Patent number 11,735,447
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Kartik Santhanam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Display screen or portion thereof with graphical user interface
- Patent number D959490
- Issue date Aug 2, 2022
- Applied Materials, Inc.
- Kartik Bhupendra Shah
- D14 - Recording, communication, or information retrieval equipment
Information Patent Grant
Safe handling of low energy, high dose arsenic, phosphorus, and bor...
- Patent number 8,927,400
- Issue date Jan 6, 2015
- Applied Materials, Inc.
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for conformal doping
- Patent number 8,501,605
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 8,003,500
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of surface dopants from a substrate
- Patent number 7,989,329
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing photoresist layer degradation in plasma immersion ion impl...
- Patent number 7,968,401
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Martin A. Hilkene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with reduced polysilicon...
- Patent number 7,723,219
- Issue date May 25, 2010
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process with chamber seasoning an...
- Patent number 7,659,184
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ENHANCED PROCESS AND HARDWARE ARCHITECTURE TO DETECT AND CORRECT RE...
- Publication number 20220122865
- Publication date Apr 21, 2022
- Kartik Santhanam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20140248759
- Publication date Sep 4, 2014
- Applied Materials, Inc.
- Majeed A. FOAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IMPLANTING DOPANT SPECIES IN A SUBSTRATE
- Publication number 20130095643
- Publication date Apr 18, 2013
- Applied Materials, Inc.
- KARTIK SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR POST DOPANT IMPLANT PURGE TREATMENT
- Publication number 20130023112
- Publication date Jan 24, 2013
- Applied Materials, Inc.
- Kartik SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLAN...
- Publication number 20120302048
- Publication date Nov 29, 2012
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMP...
- Publication number 20120289036
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONFORMAL DOPING
- Publication number 20120238074
- Publication date Sep 20, 2012
- Applied Materials, Inc.
- KARTIK SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED PLATFORM FOR IN-SITU DOPING AND ACTIVATION OF SUBSTRATES
- Publication number 20120088356
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- KARTIK SANTHANAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE
- Publication number 20110256691
- Publication date Oct 20, 2011
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPL...
- Publication number 20100190324
- Publication date Jul 29, 2010
- Applied Materials, Inc.
- MARTIN A. HILKENE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20100173484
- Publication date Jul 8, 2010
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090280628
- Publication date Nov 12, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation process with reduced polysilicon...
- Publication number 20090215250
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- Kartik Santhanam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...
- Publication number 20090215251
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- Manoj Vellaikal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE
- Publication number 20090162996
- Publication date Jun 25, 2009
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...
- Publication number 20080153271
- Publication date Jun 26, 2008
- APPLIED MATERIALS, INC.
- Majeed A. Foad
- H01 - BASIC ELECTRIC ELEMENTS

Kartik Santhanam

Person

Patents Grantslast 30 patents

Enhanced process and hardware architecture to detect and correct re...

Display screen or portion thereof with graphical user interface

Safe handling of low energy, high dose arsenic, phosphorus, and bor...

Methods and apparatus for conformal doping

Plasma immersion ion implantation process with chamber seasoning an...

Removal of surface dopants from a substrate

Reducing photoresist layer degradation in plasma immersion ion impl...

Plasma immersion ion implantation process with reduced polysilicon...

Plasma immersion ion implantation process with chamber seasoning an...

Patents Applicationslast 30 patents

ENHANCED PROCESS AND HARDWARE ARCHITECTURE TO DETECT AND CORRECT RE...

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...

METHODS FOR IMPLANTING DOPANT SPECIES IN A SUBSTRATE

METHODS FOR POST DOPANT IMPLANT PURGE TREATMENT

PRE OR POST-IMPLANT PLASMA TREATMENT FOR PLASMA IMMERSED ION IMPLAN...

SURFACE DOSE RETENTION OF DOPANTS BY PRE-AMORPHIZATION AND POST IMP...

METHODS AND APPARATUS FOR CONFORMAL DOPING

INTEGRATED PLATFORM FOR IN-SITU DOPING AND ACTIVATION OF SUBSTRATES

REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE

REDUCING PHOTORESIST LAYER DEGRADATION IN PLASMA IMMERSION ION IMPL...

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

Plasma immersion ion implantation process with reduced polysilicon...

PLASMA IMMERSION ION IMPLANTATION PROCESS WITH CHAMBER SEASONING AN...

REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE

SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BOR...