Katie Lutker-Lee

Person

Niskayuna, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoactive metal-based hard mask integration
- Patent number 12,100,591
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for highly anisotropic etching of titanium oxide spacer usin...
- Patent number 12,009,211
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming contact holes with controlled local critical dimension unif...
- Patent number 11,978,631
- Issue date May 7, 2024
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ encapsulation of metal-insulator-metal (MIM) stacks for res...
- Patent number 11,882,776
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Katie Lutker-Lee
Information Patent Grant
Methods of patterning small features
- Patent number 11,837,471
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning a dielectric layer
- Patent number 11,756,790
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Yen-Tien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for critical dimension (CD) trim of an organic pattern used...
- Patent number 11,621,164
- Issue date Apr 4, 2023
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective layers and methods of formation during plasma etching pr...
- Patent number 11,410,852
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inverse via patterning for back end of line dual damasce...
- Patent number 11,361,993
- Issue date Jun 14, 2022
- Tokyo Electron Limited
- Angelique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing methods to protect ULK materials from damage during e...
- Patent number 10,304,725
- Issue date May 28, 2019
- Tokyo Electron Limited
- Xinghua Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench and hole patterning with EUV resists using dual frequency ca...
- Patent number 9,818,610
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Hiroie Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Trench and hole patterning with EUV resists using dual frequency ca...
- Patent number 9,607,834
- Issue date Mar 28, 2017
- Tokyo Electron Limited
- Hiroie Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND STRUCTURES FOR INCREASING STABILITY OF SOFT OR ORGANIC...
- Publication number 20240404829
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Katie LUTKER-LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double Patterning Method of Patterning a Substrate
- Publication number 20240087892
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES
- Publication number 20240047210
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Features with Metal Based Resists
- Publication number 20230326755
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Hard Mask Integration
- Publication number 20230260801
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Angelique Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACTIVE METAL-BASED HARD MASK INTEGRATION
- Publication number 20230253205
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Scaling in Microfabrication
- Publication number 20230245890
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Patterning a Substrate Using Photolithography
- Publication number 20230197505
- Publication date Jun 22, 2023
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Highly Anisotropic Etching Of Titanium Oxide Spacer Usin...
- Publication number 20230154752
- Publication date May 18, 2023
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus Ring Regeneration
- Publication number 20230081862
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Yanxiang Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PATTERNING A DIELECTRIC LAYER
- Publication number 20220293419
- Publication date Sep 15, 2022
- TOKYO ELECTRON LIMITED
- Yen-Tien Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING CONTACT HOLES WITH CONTROLLED LOCAL CRITICAL DIMENSION UNIF...
- Publication number 20220181152
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CRITICAL DIMENSION (CD) TRIM OF AN ORGANIC PATTERN USED...
- Publication number 20220076942
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Pre-Treatment Method To Improve Etch Selectivity And Defecti...
- Publication number 20220037152
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Angelique Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ Encapsulation of Metal-Insulator-Metal (MIM) stacks for Res...
- Publication number 20210313513
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PATTERNING WITH SELECTIVE MANDREL FORMATION
- Publication number 20210217614
- Publication date Jul 15, 2021
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PATTERNING SMALL FEATURES
- Publication number 20210183656
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE LAYERS AND METHODS OF FORMATION DURING PLASMA ETCHING PR...
- Publication number 20210159082
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Inverse Via Patterning for Back End of Line Dual Damasce...
- Publication number 20200194308
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Angelique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHODS TO PROTECT ULK MATERIALS FROM DAMAGE DURING E...
- Publication number 20180061700
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Xinghua Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH AND HOLE PATTERNING WITH EUV RESISTS USING DUAL FREQUENCY CA...
- Publication number 20170263443
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Hiroie Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH AND HOLE PATTERNING WITH EUV RESISTS USING DUAL FREQUENCY CA...
- Publication number 20160293405
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Hiroie Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Katie Lutker-Lee

Person

Patents Grantslast 30 patents

Photoactive metal-based hard mask integration

Method for highly anisotropic etching of titanium oxide spacer usin...

Forming contact holes with controlled local critical dimension unif...

In-situ encapsulation of metal-insulator-metal (MIM) stacks for res...

Methods of patterning small features

Method for patterning a dielectric layer

Method for critical dimension (CD) trim of an organic pattern used...

Protective layers and methods of formation during plasma etching pr...

Method for inverse via patterning for back end of line dual damasce...

Manufacturing methods to protect ULK materials from damage during e...

Trench and hole patterning with EUV resists using dual frequency ca...

Trench and hole patterning with EUV resists using dual frequency ca...

Patents Applicationslast 30 patents

METHODS AND STRUCTURES FOR INCREASING STABILITY OF SOFT OR ORGANIC...

Double Patterning Method of Patterning a Substrate

DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES

Patterning Features with Metal Based Resists

Metal Hard Mask Integration

PHOTOACTIVE METAL-BASED HARD MASK INTEGRATION

Pitch Scaling in Microfabrication

Method for Patterning a Substrate Using Photolithography

Method For Highly Anisotropic Etching Of Titanium Oxide Spacer Usin...

Focus Ring Regeneration

METHOD FOR PATTERNING A DIELECTRIC LAYER

FORMING CONTACT HOLES WITH CONTROLLED LOCAL CRITICAL DIMENSION UNIF...

METHOD FOR CRITICAL DIMENSION (CD) TRIM OF AN ORGANIC PATTERN USED...

Plasma Pre-Treatment Method To Improve Etch Selectivity And Defecti...

In-situ Encapsulation of Metal-Insulator-Metal (MIM) stacks for Res...

MULTIPLE PATTERNING WITH SELECTIVE MANDREL FORMATION

METHODS OF PATTERNING SMALL FEATURES

PROTECTIVE LAYERS AND METHODS OF FORMATION DURING PLASMA ETCHING PR...

Method for Inverse Via Patterning for Back End of Line Dual Damasce...

MANUFACTURING METHODS TO PROTECT ULK MATERIALS FROM DAMAGE DURING E...

TRENCH AND HOLE PATTERNING WITH EUV RESISTS USING DUAL FREQUENCY CA...

TRENCH AND HOLE PATTERNING WITH EUV RESISTS USING DUAL FREQUENCY CA...