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Katsuaki NISHIKORI
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
Patent number
11,966,161
Issue date
Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
Patent number
11,609,495
Issue date
Mar 21, 2023
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
11,592,746
Issue date
Feb 28, 2023
JSR Corporation
Kazuya Kiriyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
11,320,735
Issue date
May 3, 2022
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, onium salt compound and meth...
Patent number
11,281,100
Issue date
Mar 22, 2022
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
Patent number
10,824,073
Issue date
Nov 3, 2020
JSR Corporation
Katsuaki Nishikori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20240094634
Publication date
Mar 21, 2024
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20230400767
Publication date
Dec 14, 2023
JSR Corporation
Takuya OMIYA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...
Publication number
20230384676
Publication date
Nov 30, 2023
JSR Corporation
Takuya OMIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20230244143
Publication date
Aug 3, 2023
JSR Corporation
Takuhiro TANIGUCHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20230236501
Publication date
Jul 27, 2023
JSR Corporation
Natsuko Kinoshita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20230236506
Publication date
Jul 27, 2023
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20230229082
Publication date
Jul 20, 2023
JSR Corporation
Katsuaki NISHIKORI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20230104260
Publication date
Apr 6, 2023
JSR Corporation
Takuya OMIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...
Publication number
20230103682
Publication date
Apr 6, 2023
JSR Corporation
Kazuki KASAHARA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20220413385
Publication date
Dec 29, 2022
JSR Corporation
Kazuya KIRIYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20220382152
Publication date
Dec 1, 2022
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20220334481
Publication date
Oct 20, 2022
JSR Corporation
Takuhiro TANIGUCHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20220299873
Publication date
Sep 22, 2022
JSR Corporation
Ryuichi NEMOTO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20220283498
Publication date
Sep 8, 2022
JSR Corporation
Katsuaki NISHIKORI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20220269172
Publication date
Aug 25, 2022
JSR Corporation
Katsuaki Nishikori
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20220177424
Publication date
Jun 9, 2022
JSR Corporation
Ryuichi NEMOTO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20220091507
Publication date
Mar 24, 2022
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
Publication number
20220091508
Publication date
Mar 24, 2022
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20220043350
Publication date
Feb 10, 2022
JSR Corporation
Kazuya Kiriyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20210389667
Publication date
Dec 16, 2021
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20210364918
Publication date
Nov 25, 2021
JSR Corporation
Katsuaki Nishikori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20210318613
Publication date
Oct 14, 2021
JSR Corporation
Katsuaki NISHIKORI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20210263413
Publication date
Aug 26, 2021
JSR Corporation
Kazuya KIRIYAMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20210124263
Publication date
Apr 29, 2021
JSR Corporation
Katsuaki Nishikori
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20200393761
Publication date
Dec 17, 2020
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20200341376
Publication date
Oct 29, 2020
JSR Corporation
Kazuya KIRIYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20200102270
Publication date
Apr 2, 2020
JSR Corporation
Natsuko KINOSHITA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20190391488
Publication date
Dec 26, 2019
JSR Corporation
Katsuaki NISHIKORI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METH...
Publication number
20190285983
Publication date
Sep 19, 2019
JSR Corporation
Katsuaki NISHIKORI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
Publication number
20180329298
Publication date
Nov 15, 2018
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY