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Substrate processing method
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Issue date Nov 5, 2013
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National University Corporation Nagaoka University of Technology
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Kanji Yasui
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Substrate processing device
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Issue date Aug 24, 2010
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Tokyo Electron Limited
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Takaaki Matsuoka
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Plasma processing apparatus
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Tokyo Electron Limited
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Vacuum processing method
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Issue date Feb 8, 2000
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Tokyo Electron Limited
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Katsuhiko Iwabuchi
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Wafer processing apparatus
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Issue date Dec 16, 1997
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Tokyo Electron Kabushiki Kaisha
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Processing apparatus
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Issue date Oct 31, 1995
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Tokyo Electron Limited
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Katsuhiko Iwabuchi
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Tokyo Electron Limited
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Tel Sagami Limited
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