Katsuhiko Namba

Person

Toyonaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition
- Patent number 7,144,674
- Issue date Dec 5, 2006
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplifying type positive resist composition
- Patent number 6,953,651
- Issue date Oct 11, 2005
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type positive resist composition
- Patent number 6,762,007
- Issue date Jul 13, 2004
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type positive resist composition
- Patent number 6,696,218
- Issue date Feb 24, 2004
- Sumitomo Chemical Company, Limited
- Kunihiro Ichimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 6,645,692
- Issue date Nov 11, 2003
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working quinonediazide sulfonic acid ester resist composit...
- Patent number 5,849,457
- Issue date Dec 15, 1998
- Sumitomo Chemical Company, Limited
- Katsuhiko Namba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20040076902
- Publication date Apr 22, 2004
- Junji Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030219677
- Publication date Nov 27, 2003
- Katsuhiko Namba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20030180663
- Publication date Sep 25, 2003
- Katsuhiko Namba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type positive resist composition
- Publication number 20030013038
- Publication date Jan 16, 2003
- Kunihiro Ichimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Chemical amplifying type positive resist composition
- Publication number 20020164540
- Publication date Nov 7, 2002
- Junji Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplifying type positive resist composition
- Publication number 20020147259
- Publication date Oct 10, 2002
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoresist composition
- Publication number 20020012874
- Publication date Jan 31, 2002
- Katsuhiko Namba
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Katsuhiko Namba

Person

Patents Grantslast 30 patents

Positive resist composition

Chemical amplifying type positive resist composition

Chemical amplification type positive resist composition

Chemical amplification type positive resist composition

Photoresist composition

Positive-working quinonediazide sulfonic acid ester resist composit...

Patents Applicationslast 30 patents

Chemical amplification type positive resist composition

Positive resist composition

Chemical amplification type positive resist composition

Chemical amplification type positive resist composition

Chemical amplifying type positive resist composition

Chemical amplifying type positive resist composition

Photoresist composition