Katsuhiro Kobayashi

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,871,427
- Issue date Oct 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and pattern surface coating composition
- Patent number 8,105,760
- Issue date Jan 31, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 8,030,515
- Issue date Oct 4, 2011
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer, fluorinated polymer, resist composition and pa...
- Patent number 7,981,589
- Issue date Jul 19, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,928,262
- Issue date Apr 19, 2011
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,919,226
- Issue date Apr 5, 2011
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lactone-containing compound, polymer, resist composition, and patte...
- Patent number 7,833,694
- Issue date Nov 16, 2010
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 7,618,765
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,569,324
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,556,909
- Issue date Jul 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 7,541,133
- Issue date Jun 2, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,531,290
- Issue date May 12, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonate salts and derivatives, photoacid generators, resist compo...
- Patent number 7,511,169
- Issue date Mar 31, 2009
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyldiazomethane compounds, photoacid generator, resist materia...
- Patent number 7,282,316
- Issue date Oct 16, 2007
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nitrogen-containing organic compound, resist composition and patter...
- Patent number 7,276,324
- Issue date Oct 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators, chemically amplified resist compositions, and...
- Patent number 7,235,343
- Issue date Jun 26, 2007
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photo acid generator, chemical amplification resist material
- Patent number 7,211,367
- Issue date May 1, 2007
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyldiazomethanes, photoacid generators, resist compositions, a...
- Patent number 7,109,311
- Issue date Sep 19, 2006
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonyldiazomethanes, photoacid generators, resist compositions, a...
- Patent number 7,101,651
- Issue date Sep 5, 2006
- Shin-Etsu Chemical Co.,Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photo acid generator, chemical amplification resist material and pa...
- Patent number 7,090,961
- Issue date Aug 15, 2006
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators, chemically amplified resist compositions, and...
- Patent number 6,916,591
- Issue date Jul 12, 2005
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyldiazomethanes, photoacid generators, resist compositions, a...
- Patent number 6,713,612
- Issue date Mar 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonyldiazomethanes, photoacid generations, resist compositions,...
- Patent number 6,689,530
- Issue date Feb 10, 2004
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...
- Publication number 20110160481
- Publication date Jun 30, 2011
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTE...
- Publication number 20090233242
- Publication date Sep 17, 2009
- Koji HASEGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION
- Publication number 20090053657
- Publication date Feb 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PA...
- Publication number 20090035699
- Publication date Feb 5, 2009
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel sulfonate salts and derivatives, photoacid generators, resist...
- Publication number 20080318160
- Publication date Dec 25, 2008
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive resist composition and patterning process
- Publication number 20080254386
- Publication date Oct 16, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...
- Publication number 20080124656
- Publication date May 29, 2008
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive resist composition and patterning process
- Publication number 20080124652
- Publication date May 29, 2008
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...
- Publication number 20070298352
- Publication date Dec 27, 2007
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist undercoat-forming material and patterning process
- Publication number 20070275325
- Publication date Nov 29, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel sulfonate salts and derivatives, photoacid generators, resist...
- Publication number 20070099113
- Publication date May 3, 2007
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonate salts and derivatives, photoacid generators, resist...
- Publication number 20070099112
- Publication date May 3, 2007
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonate salts and derivatives, photoacid generators, resist...
- Publication number 20060228648
- Publication date Oct 12, 2006
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photo acid generator, chemical amplification resist material and pa...
- Publication number 20060160023
- Publication date Jul 20, 2006
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Nitrogen-containing organic compound, resist composition and patter...
- Publication number 20050106500
- Publication date May 19, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel sulfonyldiazomethane compounds, photoacid generator, resist m...
- Publication number 20050048395
- Publication date Mar 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoacid generators, chemically amplified resist compositions, and...
- Publication number 20040229162
- Publication date Nov 18, 2004
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generators, resist compositi...
- Publication number 20040167322
- Publication date Aug 26, 2004
- Youichi Ohsawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generators, resist compositi...
- Publication number 20040166432
- Publication date Aug 26, 2004
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photo acid generator, chemical amplification resist material and pa...
- Publication number 20030224290
- Publication date Dec 4, 2003
- Tomohiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generators, resist compositi...
- Publication number 20030224298
- Publication date Dec 4, 2003
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoacid generators, chemically amplified resist compositions, and...
- Publication number 20030215738
- Publication date Nov 20, 2003
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generations, resist composit...
- Publication number 20030180653
- Publication date Sep 25, 2003
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY

Katsuhiro Kobayashi

Person

Patents Grantslast 30 patents

Positive resist composition and patterning process

Patterning process and pattern surface coating composition

Sulfonate salts and derivatives, photoacid generators, resist compo...

Fluorinated monomer, fluorinated polymer, resist composition and pa...

Sulfonate salts and derivatives, photoacid generators, resist compo...

Sulfonate salts and derivatives, photoacid generators, resist compo...

Lactone-containing compound, polymer, resist composition, and patte...

Positive resist composition and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compo...

Sulfonate salts and derivatives, photoacid generators, resist compo...

Positive resist composition and patterning process

Sulfonate salts and derivatives, photoacid generators, resist compo...

Sulfonate salts and derivatives, photoacid generators, resist compo...

Sulfonyldiazomethane compounds, photoacid generator, resist materia...

Nitrogen-containing organic compound, resist composition and patter...

Photoacid generators, chemically amplified resist compositions, and...

Photo acid generator, chemical amplification resist material

Sulfonyldiazomethanes, photoacid generators, resist compositions, a...

Sulfonyldiazomethanes, photoacid generators, resist compositions, a...

Photo acid generator, chemical amplification resist material and pa...

Photoacid generators, chemically amplified resist compositions, and...

Sulfonyldiazomethanes, photoacid generators, resist compositions, a...

Sulfonyldiazomethanes, photoacid generations, resist compositions,...

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...

LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTE...

PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PA...

Novel sulfonate salts and derivatives, photoacid generators, resist...

Positive resist composition and patterning process

NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...

Positive resist composition and patterning process

NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST...

Photoresist undercoat-forming material and patterning process

Novel sulfonate salts and derivatives, photoacid generators, resist...

Novel sulfonate salts and derivatives, photoacid generators, resist...

Novel sulfonate salts and derivatives, photoacid generators, resist...

Photo acid generator, chemical amplification resist material and pa...

Nitrogen-containing organic compound, resist composition and patter...

Novel sulfonyldiazomethane compounds, photoacid generator, resist m...

Photoacid generators, chemically amplified resist compositions, and...

Novel sulfonyldiazomethanes, photoacid generators, resist compositi...

Novel sulfonyldiazomethanes, photoacid generators, resist compositi...

Photo acid generator, chemical amplification resist material and pa...

Novel sulfonyldiazomethanes, photoacid generators, resist compositi...

Photoacid generators, chemically amplified resist compositions, and...

Novel sulfonyldiazomethanes, photoacid generations, resist composit...