Katsuhito Nishikawa

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Rapid thermal process reactor utilizing a low profile dome
- Patent number 8,610,033
- Issue date Dec 17, 2013
- Moore Epitaxial, Inc.
- Gary M. Moore
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Gas ring and method of processing substrates
- Patent number 7,794,667
- Issue date Sep 14, 2010
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating susceptor
- Patent number 6,592,675
- Issue date Jul 15, 2003
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Linear robot
- Patent number 6,491,435
- Issue date Dec 10, 2002
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Gas dispersion head
- Patent number 6,475,284
- Issue date Nov 5, 2002
- Moore Epitaxial, Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Particulate free air bearing and seal
- Patent number 6,443,618
- Issue date Sep 3, 2002
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Exhaust particulate controller and method
- Patent number 6,428,609
- Issue date Aug 6, 2002
- Moore Epitaxial, Inc.
- Gary M. Moore
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Semiconductor processing reactor controllable gas jet assembly
- Patent number 6,347,749
- Issue date Feb 19, 2002
- Moore Epitaxial, Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for controlling a gas injector in a semiconductor processing...
- Patent number 6,328,221
- Issue date Dec 11, 2001
- Moore Epitaxial, Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rapid thermal processing apparatus for processing semiconductor wafers
- Patent number 6,310,327
- Issue date Oct 30, 2001
- Moore Epitaxial Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Holding mechanism for a susceptor in a substrate processing reactor
- Patent number 6,213,478
- Issue date Apr 10, 2001
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support element
- Patent number 6,163,015
- Issue date Dec 19, 2000
- Moore Epitaxial, Inc.
- Gary M. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing apparatus for processing semiconductor wafers
- Patent number 6,151,447
- Issue date Nov 21, 2000
- Moore Technologies
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rapid thermal processing apparatus for processing semiconductor wafers
- Patent number 5,710,407
- Issue date Jan 20, 1998
- Moore Epitaxial, Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rapid thermal processing apparatus for processing semiconductor wafers
- Patent number 5,683,518
- Issue date Nov 4, 1997
- Moore Epitaxial, Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Rapid thermal processing apparatus for processing semiconductor wafers
- Patent number 5,444,217
- Issue date Aug 22, 1995
- Moore Epitaxial Inc.
- Gary M. Moore
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for transferring wafers between cassettes and...
- Patent number 4,770,590
- Issue date Sep 13, 1988
- Silicon Valley Group, Inc.
- Jean B. Hugues
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Gas ring and method of processing substrates
- Publication number 20070087533
- Publication date Apr 19, 2007
- Moore Epitaxial Inc.
- Katsuhito Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotating susceptor and method of processing substrates
- Publication number 20030029384
- Publication date Feb 13, 2003
- Moore Epitaxial, Inc.
- Katsuhito Nishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Katsuhito Nishikawa

Person

Patents Grantslast 30 patents

Rapid thermal process reactor utilizing a low profile dome

Gas ring and method of processing substrates

Rotating susceptor

Linear robot

Gas dispersion head

Particulate free air bearing and seal

Exhaust particulate controller and method

Semiconductor processing reactor controllable gas jet assembly

Method for controlling a gas injector in a semiconductor processing...

Rapid thermal processing apparatus for processing semiconductor wafers

Holding mechanism for a susceptor in a substrate processing reactor

Substrate support element

Rapid thermal processing apparatus for processing semiconductor wafers

Rapid thermal processing apparatus for processing semiconductor wafers

Rapid thermal processing apparatus for processing semiconductor wafers

Rapid thermal processing apparatus for processing semiconductor wafers

Method and apparatus for transferring wafers between cassettes and...

Patents Applicationslast 30 patents

Gas ring and method of processing substrates

Rotating susceptor and method of processing substrates