TREA

Katsumasa Kawabata

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  • Kyoto, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method of forming leveraged poromeric polishing pad
    • Patent number 11,667,061
    • Issue date Jun 6, 2023
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Wei-Wen Tsai
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Grant

    Tapering method for poromeric polishing pad
    • Patent number 10,259,099
    • Issue date Apr 16, 2019
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Thermoplastic poromeric polishing pad
    • Patent number 10,106,662
    • Issue date Oct 23, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Shuiyuan Luo
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Tapered poromeric polishing pad
    • Patent number 9,925,637
    • Issue date Mar 27, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Method for chemical mechanical polishing silicon wafers
    • Patent number 8,980,749
    • Issue date Mar 17, 2015
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Yasuyuki Itai
    • B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

  • Information Patent Application

    OFFSET PORE POROMERIC POLISHING PAD
    • Publication number 20210323116
    • Publication date Oct 21, 2021
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Wei-Wen TSAI
    • B24 - GRINDING POLISHING
  • Information Patent Application

    LEVERAGED POROMERIC POLISHING PAD
    • Publication number 20210323115
    • Publication date Oct 21, 2021
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Wei-Wen TSAI
    • B24 - GRINDING POLISHING
  • Information Patent Application

    METHOD OF FORMING LEVERAGED POROMERIC POLISHING PAD
    • Publication number 20210323202
    • Publication date Oct 21, 2021
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Wei-Wen TSAI
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    TAPERING METHOD FOR POROMERIC POLISHING PAD
    • Publication number 20180036860
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Application

    TAPERED POROMERIC POLISHING PAD
    • Publication number 20180036862
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Application

    THERMOPLASTIC POROMERIC POLISHING PAD
    • Publication number 20180037706
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Shuiyuan Luo
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...