Katsumi Okashita

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma doping method with gate shutter
- Patent number 8,652,953
- Issue date Feb 18, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a semiconductor device have fin-shaped semicon...
- Patent number 8,536,000
- Issue date Sep 17, 2013
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 8,409,939
- Issue date Apr 2, 2013
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping device with gate shutter
- Patent number 8,257,501
- Issue date Sep 4, 2012
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 8,258,585
- Issue date Sep 4, 2012
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and plasma doping system
- Patent number 8,193,080
- Issue date Jun 5, 2012
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method and apparatus
- Patent number 8,129,202
- Issue date Mar 6, 2012
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 8,124,507
- Issue date Feb 28, 2012
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a semiconductor device by plasma doping a semi...
- Patent number 8,105,926
- Issue date Jan 31, 2012
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 8,063,437
- Issue date Nov 22, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,030,187
- Issue date Oct 4, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device using plasma doping
- Patent number 8,012,862
- Issue date Sep 6, 2011
- Panasonic Corporation
- Katsumi Okashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 8,004,045
- Issue date Aug 23, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping apparatus and method, and method for manufacturing se...
- Patent number 7,972,945
- Issue date Jul 5, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method and plasma doping apparatus
- Patent number 7,939,388
- Issue date May 10, 2011
- Panasonic Corporation
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma doping method and apparatus employed in the same
- Patent number 7,871,853
- Issue date Jan 18, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,858,155
- Issue date Dec 28, 2010
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of fabricating semiconductor device
- Patent number 7,858,479
- Issue date Dec 28, 2010
- Panasonic Corporation
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping processing device and method thereof
- Patent number 7,820,230
- Issue date Oct 26, 2010
- Panasonic Corporation
- Keiichi Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 7,800,165
- Issue date Sep 21, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method
- Patent number 7,790,586
- Issue date Sep 7, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming impurity-introduced layer, method for cleaning o...
- Patent number 7,759,254
- Issue date Jul 20, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing semiconductor device and semiconductor produci...
- Patent number 7,754,503
- Issue date Jul 13, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 7,601,619
- Issue date Oct 13, 2009
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping impurities, and electronic element using the same
- Patent number 7,582,492
- Issue date Sep 1, 2009
- Panasonic Corporation
- Cheng-Guo Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for introducing impurities
- Patent number 7,456,085
- Issue date Nov 25, 2008
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method
- Patent number 7,407,874
- Issue date Aug 5, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method and plasma doping apparatus
- Patent number 7,358,511
- Issue date Apr 15, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma doping method
- Patent number 7,348,264
- Issue date Mar 25, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20130337641
- Publication date Dec 19, 2013
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20130323916
- Publication date Dec 5, 2013
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20130175586
- Publication date Jul 11, 2013
- PANASONIC CORPORATION
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD WITH GATE SHUTTER
- Publication number 20120285818
- Publication date Nov 15, 2012
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20120186519
- Publication date Jul 26, 2012
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20120119295
- Publication date May 17, 2012
- PANASONIC CORPORATION
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20120015504
- Publication date Jan 19, 2012
- PANASONIC CORPORATION
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING APPARATUS
- Publication number 20110303146
- Publication date Dec 15, 2011
- Osamu Nishijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVE FIN-SHAPED SEMICON...
- Publication number 20110275201
- Publication date Nov 10, 2011
- PANASONIC CORPORATION
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20110272763
- Publication date Nov 10, 2011
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20110217830
- Publication date Sep 8, 2011
- PANASONIC CORPORATION
- Tomohiro OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING SYSTEM
- Publication number 20110151652
- Publication date Jun 23, 2011
- Yuichiro Sssaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20110147856
- Publication date Jun 23, 2011
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20110147813
- Publication date Jun 23, 2011
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110065266
- Publication date Mar 17, 2011
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20100330782
- Publication date Dec 30, 2010
- PANASONIC CORPORATION
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING SE...
- Publication number 20100297836
- Publication date Nov 25, 2010
- PANASONIC CORPORATION
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100255615
- Publication date Oct 7, 2010
- Katsumi Okashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100207211
- Publication date Aug 19, 2010
- PANASONIC CORPORATION
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20100098837
- Publication date Apr 22, 2010
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PRODUCI...
- Publication number 20100075489
- Publication date Mar 25, 2010
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100015788
- Publication date Jan 21, 2010
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING PROCESSING DEVICE AND METHOD THEREOF
- Publication number 20090317963
- Publication date Dec 24, 2009
- Keiichi Nakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20090289300
- Publication date Nov 26, 2009
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING APPARATUS
- Publication number 20090266298
- Publication date Oct 29, 2009
- Katsumi Okashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD
- Publication number 20090233427
- Publication date Sep 17, 2009
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Apparatus
- Publication number 20090233383
- Publication date Sep 17, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Plasma Doping Apparatus
- Publication number 20090233385
- Publication date Sep 17, 2009
- PANASONIC CORPORATION
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Doping Method and Apparatus Employed in the Same
- Publication number 20090186426
- Publication date Jul 23, 2009
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Apparatus
- Publication number 20090181526
- Publication date Jul 16, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS

Katsumi Okashita

Person

Patents Grantslast 30 patents

Plasma doping method with gate shutter

Method for producing a semiconductor device have fin-shaped semicon...

Semiconductor device and method for fabricating the same

Plasma doping device with gate shutter

Semiconductor device

Method for fabricating semiconductor device and plasma doping system

Plasma doping method and apparatus

Semiconductor device and method for fabricating the same

Method for producing a semiconductor device by plasma doping a semi...

Semiconductor device and method for producing the same

Method for manufacturing semiconductor device

Method for manufacturing semiconductor device using plasma doping

Semiconductor device and method for producing the same

Plasma doping apparatus and method, and method for manufacturing se...

Plasma doping method and plasma doping apparatus

Plasma doping method and apparatus employed in the same

Plasma processing method and plasma processing apparatus

Method and apparatus of fabricating semiconductor device

Plasma doping processing device and method thereof

Semiconductor device and method for producing the same

Plasma doping method

Method for forming impurity-introduced layer, method for cleaning o...

Method for producing semiconductor device and semiconductor produci...

Method and apparatus for plasma processing

Method of doping impurities, and electronic element using the same

Method for introducing impurities

Plasma doping method

Plasma doping method and plasma doping apparatus

Plasma doping method

Patents Applicationslast 30 patents

PLASMA DOPING METHOD AND APPARATUS

PLASMA DOPING METHOD AND APPARATUS

SEMICONDUCTOR DEVICE

PLASMA DOPING METHOD WITH GATE SHUTTER

PLASMA DOPING METHOD AND APPARATUS

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

PLASMA DOPING APPARATUS

METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVE FIN-SHAPED SEMICON...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

PLASMA DOPING METHOD AND APPARATUS

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING SYSTEM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

PLASMA DOPING APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING SE...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE

PLASMA DOPING METHOD AND APPARATUS

METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PRODUCI...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA DOPING PROCESSING DEVICE AND METHOD THEREOF

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

PLASMA DOPING APPARATUS

PLASMA DOPING METHOD

Plasma Doping Method and Apparatus

Plasma Doping Method and Plasma Doping Apparatus

Plasma Doping Method and Apparatus Employed in the Same

Plasma Doping Method and Apparatus