Katsumi Ukai

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Fuchu, JP

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Patents Grantslast 30 patents

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Plasma processing apparatus
- Patent number 4,950,956
- Issue date Aug 21, 1990
- Anelva Corporation
- Tatsuo Asamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 4,816,638
- Issue date Mar 28, 1989
- Anelva Corporation
- Katsumi Ukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus comprising etching chambers of different etch...
- Patent number 4,482,419
- Issue date Nov 13, 1984
- Anelva Corporation
- Tsutomu Tsukada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectral monitoring device for both plasma etching and sputtering
- Patent number 4,405,989
- Issue date Sep 20, 1983
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching device comprising a member for bringing a specimen into...
- Patent number 4,376,692
- Issue date Mar 15, 1983
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...