Katsuro Mizukoshi

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for modifying wiring of semiconductor device
- Patent number 5,182,231
- Issue date Jan 26, 1993
- Hitachi, Ltd.
- Mikio Hongo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of providing a semiconductor IC device with an additional co...
- Patent number 5,026,664
- Issue date Jun 25, 1991
- Hitachi, Ltd.
- Mikio Hongo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming film by ion beam
- Patent number 4,687,939
- Issue date Aug 18, 1987
- Hitachi, Ltd.
- Tateoki Miyauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for summing several ring-shape laser beams
- Patent number 4,566,765
- Issue date Jan 28, 1986
- Hitachi, Ltd.
- Tateoki Miyauchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask with corrected white defects
- Patent number 4,510,222
- Issue date Apr 9, 1985
- Hitachi, Ltd.
- Masaaki Okunaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for redressing defective photomask
- Patent number 4,463,073
- Issue date Jul 31, 1984
- Hitachi, Ltd.
- Tateoki Miyauchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting transparent defects on a photomask
- Patent number 4,444,801
- Issue date Apr 24, 1984
- Hitachi, Ltd.
- Mikio Hongo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Katsuro Mizukoshi

Person

Patents Grantslast 30 patents

Method for modifying wiring of semiconductor device

Method of providing a semiconductor IC device with an additional co...

Method and apparatus for forming film by ion beam

Apparatus for summing several ring-shape laser beams

Photomask with corrected white defects

Method and apparatus for redressing defective photomask

Method and apparatus for correcting transparent defects on a photomask