Katsuyoshi Harada

Person

Okazaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for detoxifying HCD gas and apparatus therefor
- Patent number 7,976,807
- Issue date Jul 12, 2011
- Kanken Techno Co., Ltd.
- Hiroshi Imamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing silicon oxide film
- Patent number 7,488,693
- Issue date Feb 10, 2009
- Toagosei Co., Ltd.
- Hiroaki Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of producing alkoxysilanes
- Patent number 7,005,532
- Issue date Feb 28, 2006
- Toagosei Co., Ltd.
- Eiichi Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Quaternary ammonium salt and process for the preparation thereof
- Patent number 6,664,224
- Issue date Dec 16, 2003
- Toagosei Co., Ltd.
- Hiroki Kourai
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING
Information Patent Grant
Solid silica derivative and process for producing the same
- Patent number 5,985,229
- Issue date Nov 16, 1999
- Toagosei Co., Ltd.
- Yoshinori Yamada
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Alkoxysilane composition inhibited from disproportionation reaction
- Patent number 5,556,999
- Issue date Sep 17, 1996
- Toagosei Co., Ltd.
- Yoshinori Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing trialkoxysilanes
- Patent number 5,362,897
- Issue date Nov 8, 1994
- Toagosei Chemical Industry Co., Ltd.
- Katsuyoshi Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing trialkoxysilane
- Patent number 5,260,471
- Issue date Nov 9, 1993
- Toagosei Chemical Industry Co., Ltd.
- Yoshinori Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Vapor-phase epitaxial growth process by a hydrogen pretreatment ste...
- Patent number 5,221,412
- Issue date Jun 22, 1993
- Toagosei Chemical Industry Co., Ltd.
- Yoshikazu Kagata
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETOXIFYING HCD GAS AND APPARATUS THEREFOR
- Publication number 20090104100
- Publication date Apr 23, 2009
- Hiroshi Imamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for producing silicon oxide film
- Publication number 20070173072
- Publication date Jul 26, 2007
- TOAGOSEI CO., LTD.
- Hiroaki Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process of producing alkoxysilanes
- Publication number 20050020845
- Publication date Jan 27, 2005
- Eiichi Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel quaternary ammonium salt and process for the preparation thereof
- Publication number 20020006888
- Publication date Jan 17, 2002
- TOAGOSEI CO., LTD.
- Hiroki Kourai
- C07 - ORGANIC CHEMISTRY

Katsuyoshi Harada

Person

Patents Grantslast 30 patents

Method for detoxifying HCD gas and apparatus therefor

Method for producing silicon oxide film

Process of producing alkoxysilanes

Quaternary ammonium salt and process for the preparation thereof

Solid silica derivative and process for producing the same

Alkoxysilane composition inhibited from disproportionation reaction

Process for producing trialkoxysilanes

Process for producing trialkoxysilane

Vapor-phase epitaxial growth process by a hydrogen pretreatment ste...

Patents Applicationslast 30 patents

METHOD FOR DETOXIFYING HCD GAS AND APPARATUS THEREFOR

Method for producing silicon oxide film

Process of producing alkoxysilanes

Novel quaternary ammonium salt and process for the preparation thereof