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Katsuyoshi Kojima
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Polishing pad
Patent number
11,612,979
Issue date
Mar 28, 2023
Disco Corporation
Katsuyoshi Kojima
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing liquid and method of polishing SiC substrate
Patent number
9,994,739
Issue date
Jun 12, 2018
Disco Corporation
Katsuyoshi Kojima
B24 - GRINDING POLISHING
Information
Patent Grant
Method of polishing SiC substrate
Patent number
9,761,454
Issue date
Sep 12, 2017
Disco Corporation
Katsuyoshi Kojima
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
Publication number
20240076522
Publication date
Mar 7, 2024
Disco Corporation
Ayumu SAKAI
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE
Publication number
20240076521
Publication date
Mar 7, 2024
Disco Corporation
Ayumu SAKAI
B24 - GRINDING POLISHING
Information
Patent Application
MANUFACTURING METHOD OF SiC SUBSTRATE
Publication number
20230142939
Publication date
May 11, 2023
Disco Corporation
Katsuyoshi KOJIMA
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING PAD
Publication number
20200061773
Publication date
Feb 27, 2020
Disco Corporation
Katsuyoshi KOJIMA
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF POLISHING SiC SUBSTRATE
Publication number
20190311910
Publication date
Oct 10, 2019
Disco Corporation
Katsuyoshi KOJIMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF POLISHING SiC SUBSTRATE
Publication number
20160133466
Publication date
May 12, 2016
Disco Corporation
Katsuyoshi Kojima
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLISHING LIQUID AND METHOD OF POLISHING SiC SUBSTRATE
Publication number
20160130475
Publication date
May 12, 2016
Disco Corporation
Katsuyoshi Kojima
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...