Katsuyoshi Kudo

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and apparatus
- Patent number 5,961,850
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Yoshiaki Satou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and method
- Patent number 5,861,601
- Issue date Jan 19, 1999
- Hitachi, Ltd.
- Yoshiaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma treatment apparatus
- Patent number 5,647,944
- Issue date Jul 15, 1997
- Hitachi, Ltd.
- Takeshi Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treating method and apparatus therefor
- Patent number 5,085,750
- Issue date Feb 4, 1992
- Hitachi, Ltd.
- Minolu Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of detecting an end point of plasma treatment
- Patent number 4,936,967
- Issue date Jun 26, 1990
- Hitachi, Ltd.
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treating method and apparatus therefor
- Patent number 4,911,812
- Issue date Mar 27, 1990
- Hitachi, Ltd.
- Katsuyoshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treating method and apparatus therefor
- Patent number 4,795,529
- Issue date Jan 3, 1989
- Hitachi, Ltd.
- Yoshinao Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating method and apparatus therefor
- Patent number 4,664,767
- Issue date May 12, 1987
- Hitachi, Ltd.
- Katsuyoshi Kudo
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Katsuyoshi Kudo

Person

Patents Grantslast 30 patents

Plasma processing method and apparatus

Microwave plasma processing apparatus and method

Microwave plasma treatment apparatus

Plasma treating method and apparatus therefor

Method of detecting an end point of plasma treatment

Plasma treating method and apparatus therefor

Plasma treating method and apparatus therefor

Plasma treating method and apparatus therefor