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Kazuaki Matsui
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Tokyo, JP
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last 30 patents
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Patent Grant
Reflective mask and method for manufacturing same
Patent number
9,285,672
Issue date
Mar 15, 2016
Toppan Printing Co., Ltd.
Norihito Fukugami
B82 - NANO-TECHNOLOGY
Patents Applications
last 30 patents
Information
Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
Publication number
20240302732
Publication date
Sep 12, 2024
TOPPAN PHOTOMASK CO., LTD.
Kyoko KUROKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING...
Publication number
20240152045
Publication date
May 9, 2024
TOPPAN PHOTOMASK CO., LTD.
Kazuaki MATSUI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20230375908
Publication date
Nov 23, 2023
TOPPAN PHOTOMASK CO., LTD.
Kazuaki MATSUI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTUR...
Publication number
20230333461
Publication date
Oct 19, 2023
TOPPAN PHOTOMASK CO., LTD.
Kyoko KUROKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
Publication number
20230070724
Publication date
Mar 9, 2023
TOPPAN PHOTOMASK CO., LTD.
Kazuaki MATSUI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK
Publication number
20230069092
Publication date
Mar 2, 2023
HOYA CORPORATION
Hitoshi MAEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REFLECTIVE MASK AND METHOD FOR MANUFACTURING SAME
Publication number
20140170536
Publication date
Jun 19, 2014
Toppan Printing Co., Ltd.
Norihito Fukugami
B82 - NANO-TECHNOLOGY