Kazuaki Suzuki

Person

Hadano, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Boiling refrigerant type cooling system
- Patent number 9,544,988
- Issue date Jan 10, 2017
- Hitachi, Ltd.
- Kazuaki Suzuki
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Boiling refrigerant type cooling system
- Patent number 8,929,073
- Issue date Jan 6, 2015
- Hitachi, Ltd.
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Illumination-sensor calibration methods, and exposure methods and a...
- Patent number 8,018,577
- Issue date Sep 13, 2011
- Nikon Corporation
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Joint structure using a gusset plate, a building using the joint st...
- Patent number 7,703,244
- Issue date Apr 27, 2010
- Nippon Steel Corporation
- Kazuaki Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Column-and-beam join structure
- Patent number 7,497,054
- Issue date Mar 3, 2009
- Nippon Steel Corporation
- Toru Takeuchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Damping brace and structure
- Patent number 7,225,588
- Issue date Jun 5, 2007
- Nippon Steel Corporation
- Hiroshi Nakamura
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Divided reticles for charged-particle-beam microlithography apparat...
- Patent number 6,936,831
- Issue date Aug 30, 2005
- Nikon Corporation
- Tomoharu Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for controlling blur resulting from the space-c...
- Patent number 6,917,048
- Issue date Jul 12, 2005
- Nikon Corporation
- Tomoharu Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle-focus detector, and charged-particle-beam microlithography...
- Patent number 6,768,124
- Issue date Jul 27, 2004
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography methods exhibiting reduced c...
- Patent number 6,756,182
- Issue date Jun 29, 2004
- Nikon Corporation
- Sumito Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Column-and-beam join structure
- Patent number 6,739,099
- Issue date May 25, 2004
- Nippon Steel Corporation
- Toru Takeuchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Projection-exposure methods and apparatus exhibiting increased thro...
- Patent number 6,699,639
- Issue date Mar 2, 2004
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography apparatus and methods includ...
- Patent number 6,657,207
- Issue date Dec 2, 2003
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle-focus detector, and charged-particle-beam microlithography...
- Patent number 6,621,089
- Issue date Sep 16, 2003
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure method and apparatus
- Patent number 6,618,119
- Issue date Sep 9, 2003
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning exposure apparatus having adjustable illumination area and...
- Patent number 6,608,665
- Issue date Aug 19, 2003
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection-exposure methods and apparatus exhibiting increased thro...
- Patent number 6,590,218
- Issue date Jul 8, 2003
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam projection-exposure apparatus and methods exh...
- Patent number 6,573,515
- Issue date Jun 3, 2003
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 6,496,247
- Issue date Dec 17, 2002
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control apparatus and method
- Patent number 6,456,363
- Issue date Sep 24, 2002
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged-particle-beam projection-exposure methods and apparatus tha...
- Patent number 6,433,347
- Issue date Aug 13, 2002
- Nikon Corporation
- Kazuaki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Non-reciprocal circuit element and millimeter-wave hybrid integrate...
- Patent number 6,433,649
- Issue date Aug 13, 2002
- TDK Corporation
- Taro Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus
- Patent number 6,411,364
- Issue date Jun 25, 2002
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 6,384,898
- Issue date May 7, 2002
- Nikon Corporation
- Jiro Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning type exposure apparatus with multiple field diaphragms for...
- Patent number 6,295,119
- Issue date Sep 25, 2001
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and apparatus
- Patent number 6,292,254
- Issue date Sep 18, 2001
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical apparatus
- Patent number RE37352
- Issue date Sep 4, 2001
- Nikon Corporation
- Kazuaki Suzuki
- 353 - Optics: image projectors
Information Patent Grant
Scanning exposure method
- Patent number 6,277,533
- Issue date Aug 21, 2001
- Nikon Corporation
- Shinji Wakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 6,268,906
- Issue date Jul 31, 2001
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 6,259,510
- Issue date Jul 10, 2001
- Nikon Corporation
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
WORK SUPPORT DEVICE, WORK SUPPORT METHOD, AND WORK SUPPORT PROGRAM
- Publication number 20200401972
- Publication date Dec 24, 2020
- Hitachi, Ltd
- Yuichi SAKURAI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COOLING DEVICE AND ELECTRONIC DEVICE PROVIDED WITH COOLING DEVICE
- Publication number 20160334168
- Publication date Nov 17, 2016
- Hitachi, Ltd
- Kazuaki SUZUKI
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
BOILING REFRIGERANT TYPE COOLING SYSTEM
- Publication number 20150075200
- Publication date Mar 19, 2015
- Hitachi, Ltd
- Kazuaki Suzuki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BOILING REFRIGERANT TYPE COOLING SYSTEM
- Publication number 20120312504
- Publication date Dec 13, 2012
- Hitachi, Ltd
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DISPLAYING PROCESS OPERATION
- Publication number 20080209443
- Publication date Aug 28, 2008
- KAZUAKI SUZUKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Illumination-sensor calibration methods, and exposure methods and a...
- Publication number 20060290916
- Publication date Dec 28, 2006
- NIKON CORPORATION
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam joint device
- Publication number 20060144006
- Publication date Jul 6, 2006
- Kazuaki Suzuki
- E04 - BUILDING
Information Patent Application
Damping brace and structure
- Publication number 20050005539
- Publication date Jan 13, 2005
- Hiroshi Nakamura
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Column-and-beam join structure
- Publication number 20040244330
- Publication date Dec 9, 2004
- Toru Takeuchi
- E04 - BUILDING
Information Patent Application
Joint structure using a gusset plate, a building using the joint st...
- Publication number 20040211140
- Publication date Oct 28, 2004
- Kazuaki Suzuki
- E04 - BUILDING
Information Patent Application
Column-and-beam join structure
- Publication number 20040187430
- Publication date Sep 30, 2004
- NIPPON STEEL CORPORATION
- Toru Takeuchi
- E04 - BUILDING
Information Patent Application
Projection-exposure methods and apparatus exhibiting increased thro...
- Publication number 20030136922
- Publication date Jul 24, 2003
- NIKON CORPORATION
- Kazuaki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods and devices for controlling blur resulting from the space-c...
- Publication number 20030077530
- Publication date Apr 24, 2003
- NIKON CORPORATION
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Scanning exposure method and apparatus
- Publication number 20030035090
- Publication date Feb 20, 2003
- NIKON CORPORATION
- Yuji Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged-particle-beam microlithography methods exhibiting reduced c...
- Publication number 20020187411
- Publication date Dec 12, 2002
- NIKON CORPORATION
- Sumito Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Column-and-beam join structure
- Publication number 20020184836
- Publication date Dec 12, 2002
- Toru Takeuchi
- E04 - BUILDING
Information Patent Application
Reticle-focus detector, and charged-particle-beam microlithography...
- Publication number 20020000524
- Publication date Jan 3, 2002
- NIKON CORPORATION
- Kazuaki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam microlithography apparatus and methods includ...
- Publication number 20010052579
- Publication date Dec 20, 2001
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Divided reticles for charged-particle-beam microlithography apparat...
- Publication number 20010046631
- Publication date Nov 29, 2001
- NIKON CORPORATION
- Tomoharu Fujiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Non-reciprocal circuit element and millimeter-wave hybrid integrate...
- Publication number 20010045872
- Publication date Nov 29, 2001
- TDK Corporation
- Taro Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Projection exposure method and apparatus
- Publication number 20010040674
- Publication date Nov 15, 2001
- NIKON CORPORATION
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and exposure method
- Publication number 20010021010
- Publication date Sep 13, 2001
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control apparatus and method
- Publication number 20010010580
- Publication date Aug 2, 2001
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THRO...
- Publication number 20010002301
- Publication date May 31, 2001
- KAZUAKI SUZUKI
- B82 - NANO-TECHNOLOGY

Kazuaki Suzuki

Person

Patents Grantslast 30 patents

Boiling refrigerant type cooling system

Boiling refrigerant type cooling system

Illumination-sensor calibration methods, and exposure methods and a...

Joint structure using a gusset plate, a building using the joint st...

Column-and-beam join structure

Damping brace and structure

Divided reticles for charged-particle-beam microlithography apparat...

Methods and devices for controlling blur resulting from the space-c...

Reticle-focus detector, and charged-particle-beam microlithography...

Charged-particle-beam microlithography methods exhibiting reduced c...

Column-and-beam join structure

Projection-exposure methods and apparatus exhibiting increased thro...

Charged-particle-beam microlithography apparatus and methods includ...

Reticle-focus detector, and charged-particle-beam microlithography...

Projection exposure method and apparatus

Scanning exposure apparatus having adjustable illumination area and...

Projection-exposure methods and apparatus exhibiting increased thro...

Charged-particle-beam projection-exposure apparatus and methods exh...

Exposure apparatus and exposure method

Exposure control apparatus and method

Charged-particle-beam projection-exposure methods and apparatus tha...

Non-reciprocal circuit element and millimeter-wave hybrid integrate...

Exposure apparatus

Projection exposure apparatus

Scanning type exposure apparatus with multiple field diaphragms for...

Projection exposure method and apparatus

Projection optical apparatus

Scanning exposure method

Exposure apparatus and exposure method

Exposure method and apparatus

Patents Applicationslast 30 patents

WORK SUPPORT DEVICE, WORK SUPPORT METHOD, AND WORK SUPPORT PROGRAM

COOLING DEVICE AND ELECTRONIC DEVICE PROVIDED WITH COOLING DEVICE

BOILING REFRIGERANT TYPE COOLING SYSTEM

BOILING REFRIGERANT TYPE COOLING SYSTEM

APPARATUS AND METHOD FOR DISPLAYING PROCESS OPERATION

Illumination-sensor calibration methods, and exposure methods and a...

Beam joint device

Damping brace and structure

Column-and-beam join structure

Joint structure using a gusset plate, a building using the joint st...

Column-and-beam join structure

Projection-exposure methods and apparatus exhibiting increased thro...

Methods and devices for controlling blur resulting from the space-c...

Scanning exposure method and apparatus

Charged-particle-beam microlithography methods exhibiting reduced c...

Column-and-beam join structure

Reticle-focus detector, and charged-particle-beam microlithography...

Charged-particle-beam microlithography apparatus and methods includ...

Divided reticles for charged-particle-beam microlithography apparat...

Non-reciprocal circuit element and millimeter-wave hybrid integrate...

Projection exposure method and apparatus

Exposure apparatus and exposure method

Exposure control apparatus and method

PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THRO...