Kazuhiko Maeda

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoacid generating polymers containing a urethane linkage for lit...
- Patent number 9,851,639
- Issue date Dec 26, 2017
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 9,650,451
- Issue date May 16, 2017
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning agent for silicon wafer
- Patent number 9,281,178
- Issue date Mar 8, 2016
- Central Glass Company, Limited
- Soichi Kumon
- B08 - CLEANING
Information Patent Grant
Cleaning agent for silicon wafer
- Patent number 9,053,924
- Issue date Jun 9, 2015
- Central Glass Company, Limited
- Soichi Kumon
- B08 - CLEANING
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 8,691,491
- Issue date Apr 8, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer compound,...
- Patent number 8,686,098
- Issue date Apr 1, 2014
- Central Glass Company, Limited
- Kazunori Mori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing sulfonates having polymerizable anions and manu...
- Patent number 8,663,897
- Issue date Mar 4, 2014
- Central Glass Company, Limited
- Takashi Masubuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Top coating composition
- Patent number 8,663,903
- Issue date Mar 4, 2014
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer compound,...
- Patent number 8,592,540
- Issue date Nov 26, 2013
- Central Glass Company, Limited
- Kazunori Mori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound for photoacid generator, resist composition using the same...
- Patent number 8,435,717
- Issue date May 7, 2013
- Central Glass Company, Limited
- Yuji Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonic acid salt and derivative thereof, photoacid generator agen...
- Patent number 8,283,106
- Issue date Oct 9, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing polymer coating composition, method for forming...
- Patent number 8,211,612
- Issue date Jul 3, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 8,115,036
- Issue date Feb 14, 2012
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 7,947,422
- Issue date May 24, 2011
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
- Patent number 7,932,348
- Issue date Apr 26, 2011
- Central Glass Company, Limited
- Hiroshi Saegusa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating materials consisting of low- or medium-molecular organic co...
- Patent number 7,919,224
- Issue date Apr 5, 2011
- Central Glass Company, Limited
- Satoru Miyazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive polyimide composition and polyimide precursor compos...
- Patent number 7,851,121
- Issue date Dec 14, 2010
- Central Glass Co., Ltd.
- Kazuhiro Yamanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
- Patent number 7,825,280
- Issue date Nov 2, 2010
- Central Glass Company, Limited
- Hiroshi Saegusa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...
- Patent number 7,781,602
- Issue date Aug 24, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing polymerisable monomer and polymer prepared by u...
- Patent number 7,759,440
- Issue date Jul 20, 2010
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing cyclic compound, fluorine-containing polymer co...
- Patent number 7,736,835
- Issue date Jun 15, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
- Patent number 7,728,103
- Issue date Jun 1, 2010
- Central Glass Company, Limited
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Magnetic disk glass substrate manufacturing method
- Patent number 7,703,303
- Issue date Apr 27, 2010
- Hoya Corporation
- Hideki Isono
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Ester compound, polymer, resist composition, and patterning process
- Patent number 7,666,967
- Issue date Feb 23, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
- Patent number 7,629,434
- Issue date Dec 8, 2009
- Central Glass Company, Limited
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 7,569,323
- Issue date Aug 4, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated diamine and polymer made from the same
- Patent number 7,550,553
- Issue date Jun 23, 2009
- Central Glass Company, Limited
- Kazuhiro Yamanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyester compound and resist material using the same
- Patent number 7,517,635
- Issue date Apr 14, 2009
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,488,567
- Issue date Feb 10, 2009
- Panasonic Corporation
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Transparent fluorine-containing copolymer
- Patent number 7,417,100
- Issue date Aug 26, 2008
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Cleaning Agent for Silicon Wafer
- Publication number 20140174465
- Publication date Jun 26, 2014
- Central Glass Company, Limited
- Soichi KUMON
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...
- Publication number 20140171584
- Publication date Jun 19, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...
- Publication number 20130260313
- Publication date Oct 3, 2013
- Central Glass Co., Ltd.
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Water Repellent Additive for Immersion Resist
- Publication number 20130216960
- Publication date Aug 22, 2013
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, Resist Material Containing Same, and Method for Forming Pa...
- Publication number 20130177848
- Publication date Jul 11, 2013
- CENTRAL GLASS COMPANY LIMITED
- Yusuke Kanto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Compound for Photoacid Generator, Resist Composition Using the Same...
- Publication number 20130130175
- Publication date May 23, 2013
- Central Glass Company, Limited
- Yuji HAGIWARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer Compound,...
- Publication number 20120077126
- Publication date Mar 29, 2012
- Kazunori Mori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Water Repellent Additive for Immersion Resist
- Publication number 20120064459
- Publication date Mar 15, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top Coating Composition
- Publication number 20120040294
- Publication date Feb 16, 2012
- Central Glass Company, Limited
- Kazuhiko Maeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer Compound,...
- Publication number 20110318542
- Publication date Dec 29, 2011
- Central Glass Company, Limited
- Kazunori Mori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Cleaning Agent For Silicon Wafer
- Publication number 20110214685
- Publication date Sep 8, 2011
- Central Glass Company, Limited
- Soichi KUMON
- B08 - CLEANING
Information Patent Application
Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...
- Publication number 20110196121
- Publication date Aug 11, 2011
- Central Glass Company, Limited
- Shinichi Sumida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Sulfonates Having Polymerizable Anions and Manu...
- Publication number 20110177453
- Publication date Jul 21, 2011
- CENTRAL GLASS COMPANY, LIMITED
- Takashi Masubuchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generato...
- Publication number 20100304303
- Publication date Dec 2, 2010
- Central Glass Company, Limited
- Kazuhiko Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
- Publication number 20100234556
- Publication date Sep 16, 2010
- Central Glass Company, Limited
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive Polyimides and Methods of Making the Same
- Publication number 20100216070
- Publication date Aug 26, 2010
- CENTRAL GLASS CO., LTD.
- Kazuhiro Yamanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20100204422
- Publication date Aug 12, 2010
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Compound for Photoacid Generator, Resist Composition Using the Same...
- Publication number 20100035185
- Publication date Feb 11, 2010
- Central Glass Company, Ltd.
- Yuji Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive Polybenzoxazines and Methods of Making the Same
- Publication number 20100009290
- Publication date Jan 14, 2010
- CENTRAL GLASS CO., LTD.
- Kazuhiro Yamanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
- Publication number 20090292104
- Publication date Nov 26, 2009
- Central Glass Company, Limited
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating Materials Consisting of Low- or Medium-Molecular Organic Co...
- Publication number 20090272295
- Publication date Nov 5, 2009
- Central Glass Company, Limited
- Satoru Miyazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE POLYIMIDE COMPOSITION AND POLYIMIDE PRECURSOR COMPOS...
- Publication number 20090176172
- Publication date Jul 9, 2009
- Central Glass Co., Ltd.
- Kazuhiro Yamanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-containing polymerizable monomer and polymer compound usin...
- Publication number 20090023886
- Publication date Jan 22, 2009
- Central Glass Company, Limited
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
- Publication number 20080234460
- Publication date Sep 25, 2008
- Hiroshi Saegusa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated Diamine and Polymer Made from the Same
- Publication number 20080221298
- Publication date Sep 11, 2008
- Central Glass Company, Limited
- Kazuhiro Yamanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...
- Publication number 20080194764
- Publication date Aug 14, 2008
- Central Glass Company Limited
- Haruhiko KOMORIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polyester compound and resist material using the same
- Publication number 20080050674
- Publication date Feb 28, 2008
- Central Glass Company, Limited
- Satoru Miyazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...
- Publication number 20080003517
- Publication date Jan 3, 2008
- Central Glass Company, Limited
- Haruhiko Komoriya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel ester compound, polymer, resist composition, and patterning p...
- Publication number 20070128555
- Publication date Jun 7, 2007
- Central Glass Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-containing polymer coating composition, method for forming...
- Publication number 20070105044
- Publication date May 10, 2007
- Central Glass Company, Limited
- Kazuhiko Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazuhiko Maeda

Person

Patents Grantslast 30 patents

Photoacid generating polymers containing a urethane linkage for lit...

Fluorine-containing compounds and their polymers useful for anti-re...

Cleaning agent for silicon wafer

Cleaning agent for silicon wafer

Fluorine-containing compounds and their polymers useful for anti-re...

Fluorine-containing compound, fluorine-containing polymer compound,...

Fluorine-containing sulfonates having polymerizable anions and manu...

Top coating composition

Fluorine-containing compound, fluorine-containing polymer compound,...

Compound for photoacid generator, resist composition using the same...

Sulfonic acid salt and derivative thereof, photoacid generator agen...

Fluorine-containing polymer coating composition, method for forming...

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Fluorine-containing compounds and their polymers useful for anti-re...

Fluorine-containing polymerizable monomer and polymer compound usin...

Coating materials consisting of low- or medium-molecular organic co...

Photosensitive polyimide composition and polyimide precursor compos...

Fluorine-containing polymerizable monomer and polymer compound usin...

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropol...

Fluorine-containing polymerisable monomer and polymer prepared by u...

Fluorine-containing cyclic compound, fluorine-containing polymer co...

Fluorine-containing polymerizable monomer and polymer compound usin...

Magnetic disk glass substrate manufacturing method

Ester compound, polymer, resist composition, and patterning process

Fluorine-containing polymerizable monomer and polymer compound usin...

Resist protective coating material and patterning process

Fluorinated diamine and polymer made from the same

Polyester compound and resist material using the same

Polymer, resist composition and patterning process

Transparent fluorine-containing copolymer

Patents Applicationslast 30 patents

Cleaning Agent for Silicon Wafer

Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...

PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...

Water Repellent Additive for Immersion Resist

Polymer, Resist Material Containing Same, and Method for Forming Pa...

Compound for Photoacid Generator, Resist Composition Using the Same...

Fluorine-Containing Compound, Fluorine-Containing Polymer Compound,...

Water Repellent Additive for Immersion Resist

Top Coating Composition

Fluorine-Containing Compound, Fluorine-Containing Polymer Compound,...

Cleaning Agent For Silicon Wafer

Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...

Fluorine-Containing Sulfonates Having Polymerizable Anions and Manu...

Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generato...

Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...

Photosensitive Polyimides and Methods of Making the Same

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Compound for Photoacid Generator, Resist Composition Using the Same...

Photosensitive Polybenzoxazines and Methods of Making the Same

Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...

Coating Materials Consisting of Low- or Medium-Molecular Organic Co...

PHOTOSENSITIVE POLYIMIDE COMPOSITION AND POLYIMIDE PRECURSOR COMPOS...

Fluorine-containing polymerizable monomer and polymer compound usin...

Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...

Fluorinated Diamine and Polymer Made from the Same

Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropol...

Polyester compound and resist material using the same

Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Co...

Novel ester compound, polymer, resist composition, and patterning p...

Fluorine-containing polymer coating composition, method for forming...