Kazuhiko Nakayama

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 7,582,406
- Issue date Sep 1, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing resist pattern
- Patent number 7,105,265
- Issue date Sep 12, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-sensitivity positive-working photoresist composition
- Patent number 5,601,961
- Issue date Feb 11, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuhiko Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Resist Composition And Method For Forming Resist Pattern
- Publication number 20090004598
- Publication date Jan 1, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution for lithography
- Publication number 20070026346
- Publication date Feb 1, 2007
- Kazuhiko Nakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and removing resist pattern
- Publication number 20050130055
- Publication date Jun 16, 2005
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY