Kazuhiko Takase

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Post-dry etching cleaning liquid composition and process for fabric...
- Patent number 8,513,140
- Issue date Aug 20, 2013
- Sony Corporation
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and chemical fluid used f...
- Patent number 7,776,754
- Issue date Aug 17, 2010
- Kabushiki Kaisha Toshiba
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method for removing residue generated b...
- Patent number 7,700,490
- Issue date Apr 20, 2010
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and a cleaning device for cleaning an edge portion...
- Patent number 7,632,358
- Issue date Dec 15, 2009
- Kabushiki Kaisha Toshiba
- Masao Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning/drying equipment and substrate cleaning/drying m...
- Patent number 6,152,153
- Issue date Nov 28, 2000
- Kabushiki Kaisha Toshiba
- Kazuhiko Takase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning semiconductor wafers
- Patent number 5,810,940
- Issue date Sep 22, 1998
- Kabushiki Kaisha Toshiba
- Yuji Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 5,744,402
- Issue date Apr 28, 1998
- Kabushiki Kaisha Toshiba
- Yuji Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20110014793
- Publication date Jan 20, 2011
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning method and a cleaning device for cleaning an edge portion...
- Publication number 20100051073
- Publication date Mar 4, 2010
- Kabushiki Kaisha Toshiba
- Masao Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20080188085
- Publication date Aug 7, 2008
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Residue treatment system, residue treatment method, and method of m...
- Publication number 20070178702
- Publication date Aug 2, 2007
- Kabushiki Kaisha Toshiba
- Tsuyoshi Matsumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing method and chemical fluid used f...
- Publication number 20070082491
- Publication date Apr 12, 2007
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning method and a cleaning device for cleaning an edge portion...
- Publication number 20060272676
- Publication date Dec 7, 2006
- Masao Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20060019201
- Publication date Jan 26, 2006
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kazuhiko Takase

Person

Patents Grantslast 30 patents

Post-dry etching cleaning liquid composition and process for fabric...

Semiconductor device manufacturing method and chemical fluid used f...

Semiconductor manufacturing method for removing residue generated b...

Cleaning method and a cleaning device for cleaning an edge portion...

Substrate cleaning/drying equipment and substrate cleaning/drying m...

Method for cleaning semiconductor wafers

Method of manufacturing semiconductor devices

Patents Applicationslast 30 patents

Post-dry etching cleaning liquid composition and process for fabric...

Cleaning method and a cleaning device for cleaning an edge portion...

Post-dry etching cleaning liquid composition and process for fabric...

Residue treatment system, residue treatment method, and method of m...

Semiconductor device manufacturing method and chemical fluid used f...

Cleaning method and a cleaning device for cleaning an edge portion...

Post-dry etching cleaning liquid composition and process for fabric...