Kazuhiro Enomoto

Person

Hitachi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,696,929
- Issue date Apr 15, 2014
- Hitachi Chemical Co., Ltd.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Grant
Cerium oxide slurry, cerium oxide polishing slurry and method for p...
- Patent number 8,591,612
- Issue date Nov 26, 2013
- Hitachi Chemical Co., Ltd.
- Kazuhiro Enomoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP abrasive slurry for polishing insulation film, polishing method...
- Patent number 8,524,111
- Issue date Sep 3, 2013
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for chemical mechanical polishing and method for p...
- Patent number 8,231,735
- Issue date Jul 31, 2012
- Hitachi Chemical Co., Ltd.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 8,168,541
- Issue date May 1, 2012
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing compound and polishing method
- Patent number 7,838,482
- Issue date Nov 23, 2010
- Hitachi Chemical Co. Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and polishing method
- Patent number 7,837,800
- Issue date Nov 23, 2010
- Hitachi Chemical Co., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,687,590
- Issue date Mar 30, 2010
- Hitachi Chemical Company, Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,682,701
- Issue date Mar 23, 2010
- Hitachi Chemical Co., Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing fluid and polishing method
- Patent number 7,367,870
- Issue date May 6, 2008
- Hitachi Chemical Co. Ltd.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,358,300
- Issue date Apr 15, 2008
- Hitachi Chemical Co., Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing slurry for chemical mechanical polishing and method for p...
- Patent number 7,311,855
- Issue date Dec 25, 2007
- Hitachi Chemical Co., Ltd.
- Kouji Haga
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CARBON-DIOXIDE RECOVERY APPARATUS, AND CARBON-DIOXIDE RECOVERY METHOD
- Publication number 20160220943
- Publication date Aug 4, 2016
- Hitachi Chemical Company, Ltd.
- Kouhei YOSHIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CARBON-DIOXIDE CAPTURING MATERIAL, AND CARBON-DIOXIDE RECOVERY APPA...
- Publication number 20160199808
- Publication date Jul 14, 2016
- Hitachi Chemical Company, Ltd.
- Kouhei YOSHIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CERIUM OXIDE SLURRY, CERIUM OXIDE POLISHING SLURRY AND METHOD FOR P...
- Publication number 20130125476
- Publication date May 23, 2013
- HITACHI CHEMICAL CO., Ltd.
- Kazuhiro Enomoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20130059439
- Publication date Mar 7, 2013
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20120299158
- Publication date Nov 29, 2012
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY AND POLISHING METHOD
- Publication number 20110028073
- Publication date Feb 3, 2011
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...
- Publication number 20090047786
- Publication date Feb 19, 2009
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP polishing slurry and polishing method
- Publication number 20080214093
- Publication date Sep 4, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for chemical mechanical polishing and method for p...
- Publication number 20080176982
- Publication date Jul 24, 2008
- HITACHI CEHMICAL CO., LTD.
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry and polishing method
- Publication number 20080003924
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., LTD.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Application
Polishing slurry and polishing method
- Publication number 20070295934
- Publication date Dec 27, 2007
- HITACHI CHEMICAL CO., LTD.
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20070218811
- Publication date Sep 20, 2007
- HITACHI CHEMICAL CO., Ltd.
- Yasushi Kurata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for silicon oxide, additive liquid and polishing m...
- Publication number 20070175104
- Publication date Aug 2, 2007
- HITACHI CHEMICAL CO., Ltd.
- Masaya Nishiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CERIUM OXIDE SLURRY, CERIUM OXIDE POLISHING SLURRY AND METHOD FOR P...
- Publication number 20070093183
- Publication date Apr 26, 2007
- HITACHI CHEMICAL CO., Ltd.
- Shigeru Yoshikawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20060199021
- Publication date Sep 7, 2006
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Cmp polishing compound and polishing method
- Publication number 20060148667
- Publication date Jul 6, 2006
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for chemical mechanical polishing and method for p...
- Publication number 20060124591
- Publication date Jun 15, 2006
- Kouji Haga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20060052566
- Publication date Mar 9, 2006
- HITACHI CHEMICAL CO., Ltd.
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20050255326
- Publication date Nov 17, 2005
- HITACHI CHEMICAL CO., Ltd.
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing fluid and polishing method
- Publication number 20050181609
- Publication date Aug 18, 2005
- Yasushi Kurata
- B24 - GRINDING POLISHING
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20050119394
- Publication date Jun 2, 2005
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20040253462
- Publication date Dec 16, 2004
- HITACHI CHEMICAL CO., Ltd.
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kazuhiro Enomoto

Person

Patents Grantslast 30 patents

Polishing solution for CMP and polishing method using the polishing...

Polishing slurry and polishing method

Cerium oxide slurry, cerium oxide polishing slurry and method for p...

CMP abrasive slurry for polishing insulation film, polishing method...

Polishing slurry for chemical mechanical polishing and method for p...

CMP polishing slurry and polishing method

CMP polishing compound and polishing method

CMP polishing slurry and polishing method

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Polishing fluid and polishing method

Composition for forming silica based coating film, silica based coa...

Polishing slurry for chemical mechanical polishing and method for p...

Patents Applicationslast 30 patents

CARBON-DIOXIDE RECOVERY APPARATUS, AND CARBON-DIOXIDE RECOVERY METHOD

CARBON-DIOXIDE CAPTURING MATERIAL, AND CARBON-DIOXIDE RECOVERY APPA...

CERIUM OXIDE SLURRY, CERIUM OXIDE POLISHING SLURRY AND METHOD FOR P...

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

CMP POLISHING SLURRY AND POLISHING METHOD

CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method...

CMP polishing slurry and polishing method

Polishing slurry for chemical mechanical polishing and method for p...

Polishing slurry and polishing method

Polishing slurry and polishing method

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

Polishing slurry for silicon oxide, additive liquid and polishing m...

CERIUM OXIDE SLURRY, CERIUM OXIDE POLISHING SLURRY AND METHOD FOR P...

Composition, methods for forming low-permittivity film using the co...

Cmp polishing compound and polishing method

Polishing slurry for chemical mechanical polishing and method for p...

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Polishing fluid and polishing method

Composition for forming silica based coating film, silica based coa...

Composition, methods for forming low-permittivity film using the co...