Kazuhiro Katayama

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,940,728
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,774,853
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,560,355
- Issue date Jan 24, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator, chemically amplified resist composition, and p...
- Patent number 11,022,881
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Kazuya Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 11,009,793
- Issue date May 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and pattern forming process
- Patent number 10,921,710
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, resist composition, and patterning process
- Patent number 10,754,248
- Issue date Aug 25, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,591,819
- Issue date Mar 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,527,939
- Issue date Jan 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Carboxylic acid onium salt, chemically amplified resist composition...
- Patent number 10,120,278
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,023,674
- Issue date Jul 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,927,708
- Issue date Mar 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, monomer, resist composition, and patterning process
- Patent number 9,790,166
- Issue date Oct 17, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 9,758,609
- Issue date Sep 12, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,632,415
- Issue date Apr 25, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,618,850
- Issue date Apr 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,519,213
- Issue date Dec 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 9,274,425
- Issue date Mar 1, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 9,250,523
- Issue date Feb 2, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 9,235,122
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process, resist composition, polymer, and monomer
- Patent number 9,213,235
- Issue date Dec 15, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process, resist composition, polymer, and monomer
- Patent number 9,182,668
- Issue date Nov 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 9,164,384
- Issue date Oct 20, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative pattern forming process
- Patent number 9,091,933
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 9,086,625
- Issue date Jul 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,081,290
- Issue date Jul 14, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning process, resist composition, polymer, and polymerizable...
- Patent number 9,057,949
- Issue date Jun 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
- Publication number 20240361690
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240210830
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240036466
- Publication date Feb 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230161254
- Publication date May 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230137472
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20230134822
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230132653
- Publication date May 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230116120
- Publication date Apr 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...
- Publication number 20220107560
- Publication date Apr 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220100089
- Publication date Mar 31, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...
- Publication number 20210179554
- Publication date Jun 17, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200379345
- Publication date Dec 3, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...
- Publication number 20200369605
- Publication date Nov 26, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PA...
- Publication number 20200319550
- Publication date Oct 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20200223796
- Publication date Jul 16, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200192222
- Publication date Jun 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200081341
- Publication date Mar 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
- Publication number 20190324367
- Publication date Oct 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kazuya Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190235381
- Publication date Aug 1, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST QUALITY CONTROL METHOD AND METHOD FOR OBTAINING RESIST QUALI...
- Publication number 20190129304
- Publication date May 2, 2019
- Shin-Etsu Chemical Co., Ltd.
- Naoki ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20190064664
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20190033715
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20180275516
- Publication date Sep 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takayuki FUJIWARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20170315442
- Publication date Nov 2, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170226252
- Publication date Aug 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20170131635
- Publication date May 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20160342086
- Publication date Nov 24, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING PROCESS AND SHRINK AGENT
- Publication number 20160202612
- Publication date Jul 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20160179002
- Publication date Jun 23, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING PROCESS AND SHRINK AGENT
- Publication number 20160139512
- Publication date May 19, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kazuhiro Katayama

Person

Patents Grantslast 30 patents

Molecular resist composition and patterning process

Molecular resist composition and patterning process

Resist composition and patterning process

Sulfonium compound, chemically amplified resist composition, and pa...

Onium salt, chemically amplified resist composition, and patterning...

Iodonium salt, resist composition, and pattern forming process

Photoacid generator, chemically amplified resist composition, and p...

Monomer, polymer, resist composition, and patterning process

Resist composition and pattern forming process

Sulfonium salt, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Carboxylic acid onium salt, chemically amplified resist composition...

Monomer, polymer, resist composition, and patterning process

Pattern forming process and shrink agent

Polymer, monomer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Pattern forming process and shrink agent

Pattern forming process and shrink agent

Patterning process and resist composition

Resist composition and patterning process

Resist composition and patterning process

Monomer, polymer, resist composition, and patterning process

Patterning process, resist composition, polymer, and monomer

Patterning process, resist composition, polymer, and monomer

Patterning process and resist composition

Negative pattern forming process

Resist composition and patterning process

Patterning process and resist composition

Patterning process, resist composition, polymer, and polymerizable...

Patents Applicationslast 30 patents

Resist Material, Resist Composition, Patterning Process, And Monomer

RESIST COMPOSITION AND PATTERN FORMING PROCESS

Onium Salt, Resist Composition, And Patterning Process

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTER...

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PA...

MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING...

SULFONIUM COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PA...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

RESIST COMPOSITION AND PATTERNING PROCESS

IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST QUALITY CONTROL METHOD AND METHOD FOR OBTAINING RESIST QUALI...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPO...

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

POLYMER, MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERN FORMING PROCESS AND SHRINK AGENT

MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERN FORMING PROCESS AND SHRINK AGENT