Kazuhiro MARUMO

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,584,810
- Issue date Feb 21, 2023
- FUJIFILM Corporation
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,579,528
- Issue date Feb 14, 2023
- FUJIFILM Corporation
- Ryo Nishio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing pattern laminate, method for producing reversa...
- Patent number 11,029,597
- Issue date Jun 8, 2021
- FUJIFILM Corporation
- Yuichiro Goto
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427242
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Yosuke BEKKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240402601
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Publication number 20240219831
- Publication date Jul 4, 2024
- FUJIFILM CORPORATION
- Kazuhiro MARUMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DE...
- Publication number 20230067750
- Publication date Mar 2, 2023
- FUJIFILM CORPORATION
- Kazuhiro MARUMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...
- Publication number 20220382153
- Publication date Dec 1, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20220334476
- Publication date Oct 20, 2022
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20220107561
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Keiyu OU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210088905
- Publication date Mar 25, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...
- Publication number 20200183279
- Publication date Jun 11, 2020
- FUJI FILM Corporation
- Kazuhiro MARUMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...
- Publication number 20200183274
- Publication date Jun 11, 2020
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200159117
- Publication date May 21, 2020
- FUJIFILM CORPORATION
- Ryo NISHIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20190204736
- Publication date Jul 4, 2019
- FUJIFILM CORPORATION
- Kazuhiro MARUMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190171104
- Publication date Jun 6, 2019
- FUJIFILM CORPORATION
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSA...
- Publication number 20180364566
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Yuichiro GOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING ME...
- Publication number 20180037688
- Publication date Feb 8, 2018
- FUJIFILM CORPORATION
- Yuichiro GOTO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Kazuhiro MARUMO

Person

Patents Grantslast 30 patents

Method for producing actinic ray-sensitive or radiation-sensitive r...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Method for producing pattern laminate, method for producing reversa...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE

PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DE...

POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSA...

CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING ME...