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Kazuhiro MARUMO
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Haibara-gun, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
Patent number
11,584,810
Issue date
Feb 21, 2023
FUJIFILM Corporation
Akira Takada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,579,528
Issue date
Feb 14, 2023
FUJIFILM Corporation
Ryo Nishio
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for producing pattern laminate, method for producing reversa...
Patent number
11,029,597
Issue date
Jun 8, 2021
FUJIFILM Corporation
Yuichiro Goto
B81 - MICRO-STRUCTURAL TECHNOLOGY
Patents Applications
last 30 patents
Information
Patent Application
PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DE...
Publication number
20230067750
Publication date
Mar 2, 2023
FUJIFILM CORPORATION
Kazuhiro MARUMO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...
Publication number
20220382153
Publication date
Dec 1, 2022
FUJIFILM CORPORATION
Akira TAKADA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20220334476
Publication date
Oct 20, 2022
FUJIFILM CORPORATION
Masafumi KOJIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
Publication number
20220107561
Publication date
Apr 7, 2022
FUJIFILM CORPORATION
Keiyu OU
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210088905
Publication date
Mar 25, 2021
FUJIFILM CORPORATION
Masafumi KOJIMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...
Publication number
20200183279
Publication date
Jun 11, 2020
FUJI FILM Corporation
Kazuhiro MARUMO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...
Publication number
20200183274
Publication date
Jun 11, 2020
FUJIFILM CORPORATION
Naohiro TANGO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20200159117
Publication date
May 21, 2020
FUJIFILM CORPORATION
Ryo NISHIO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20190204736
Publication date
Jul 4, 2019
FUJIFILM CORPORATION
Kazuhiro MARUMO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20190171104
Publication date
Jun 6, 2019
FUJIFILM CORPORATION
Akira Takada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSA...
Publication number
20180364566
Publication date
Dec 20, 2018
FUJIFILM CORPORATION
Yuichiro GOTO
B82 - NANO-TECHNOLOGY
Information
Patent Application
CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING ME...
Publication number
20180037688
Publication date
Feb 8, 2018
FUJIFILM CORPORATION
Yuichiro GOTO
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL