Kazuhisa Onozawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition containing siloxane compound and phenol compound
- Patent number 7,737,291
- Issue date Jun 15, 2010
- Adeka Corporation
- Kunio Osasawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of forming thin film and precursor for chemical vapor depos...
- Patent number 6,743,933
- Issue date Jun 1, 2004
- Asahi Denka Co., Ltd.
- Kazuhisa Onozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal compound solution and thin film formation using the same
- Patent number 6,547,863
- Issue date Apr 15, 2003
- Asahi Denka Kogyo Kabushiki Kaisha
- Kazuhisa Onozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper material for chemical vapor deposition and process for formi...
- Patent number 6,429,325
- Issue date Aug 6, 2002
- Asahi Denka Kogyo Kabushiki Kaisha
- Kazuhisa Onozawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of producing a ruthenium or ruthenium oxide thin film
- Patent number 6,316,064
- Issue date Nov 13, 2001
- Asahi Denka Kogyo Kabushiki Kaisha
- Kazuhisa Onozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing waste gas exhausted from chemical vapor and d...
- Patent number 5,855,651
- Issue date Jan 5, 1999
- Asahi Denka Kogyo K.K.
- Naoyasu Kurita
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Composition Containing Siloxane Compound and Phenol Compound
- Publication number 20070232821
- Publication date Oct 4, 2007
- Kunio Ogasawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Precursor for chemical vapor deposition and thin film formation pro...
- Publication number 20040086643
- Publication date May 6, 2004
- ASAHI DENKA CO., LTD.
- Kazuhisa Onozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process of forming thin film and precursor for chemical vapor depos...
- Publication number 20030124251
- Publication date Jul 3, 2003
- ASAHI DENKA CO., LTD.
- Kazuhisa Onozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kazuhisa Onozawa

Person

Patents Grantslast 30 patents

Composition containing siloxane compound and phenol compound

Process of forming thin film and precursor for chemical vapor depos...

Metal compound solution and thin film formation using the same

Copper material for chemical vapor deposition and process for formi...

Process of producing a ruthenium or ruthenium oxide thin film

Method for processing waste gas exhausted from chemical vapor and d...

Patents Applicationslast 30 patents

Composition Containing Siloxane Compound and Phenol Compound

Precursor for chemical vapor deposition and thin film formation pro...

Process of forming thin film and precursor for chemical vapor depos...