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Kazuhito Nakamura
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Nagoya-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method for cleaning substrate processing chamber
Patent number
7,456,109
Issue date
Nov 25, 2008
Tokyo Electron Limited
Hideaki Yamasaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for processing a substrate
Patent number
7,419,702
Issue date
Sep 2, 2008
Tokyo Electron Limited
Kazuhito Nakamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming a tantalum-containing gate electrode structure
Patent number
7,067,422
Issue date
Jun 27, 2006
Tokyo Electron Limited
Kazuhito Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
CVD process capable of reducing incubation time
Patent number
7,063,871
Issue date
Jun 20, 2006
Tokyo Electron Limited
Hideaki Yamasaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
METHOD OF FORMING TASIN FILM
Publication number
20090197410
Publication date
Aug 6, 2009
TOKYO ELECTRON LIMITED
Kazuhito Nakamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of Film Deposition and Film Deposition System
Publication number
20090142491
Publication date
Jun 4, 2009
Kazuhito Nakamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR TREATING SUBSTRATE AND RECORDING MEDIUM
Publication number
20090117270
Publication date
May 7, 2009
TOKYO ELECTRON LIMITED
Hideaki Yamasaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method for cleaning substrate processing chamber
Publication number
20060124151
Publication date
Jun 15, 2006
TOKYO ELECTRON LIMITED
Hideaki Yamasaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CVD tantalum compounds for FET gate electrodes
Publication number
20050250318
Publication date
Nov 10, 2005
Vijay Narayanan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of forming a tantalum-containing gate electrode structure
Publication number
20050227441
Publication date
Oct 13, 2005
TOKYO ELECTRON LIMITED
Kazuhito Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for processing a substrate
Publication number
20050221002
Publication date
Oct 6, 2005
TOKYO ELECTRON LIMITED
Kazuhito Nakamura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CVD tantalum compounds for FET get electrodes
Publication number
20050104142
Publication date
May 19, 2005
Vijav Narayanan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CVD process capable of reducing incubation time
Publication number
20040025789
Publication date
Feb 12, 2004
TOKYO ELECTRON LIMITED
Hideaki Yamasaki
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...