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Kazuhito Sasaki
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Positive resist composition for immersion exposure and method of fo...
Patent number
7,968,269
Issue date
Jun 28, 2011
Tokyo Ohka Kogyo Co., Ltd.
Kazuhito Sasaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist composition and method of forming resist pattern
Patent number
7,598,017
Issue date
Oct 6, 2009
Tokyo Ohka Kogyo Co., Ltd.
Jun Iwashita
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist composition, multilayer body, and method for forming resist...
Patent number
7,544,460
Issue date
Jun 9, 2009
Tokyo Ohka Kogyo Co., Ltd.
Hideo Hada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist composition
Patent number
6,749,989
Issue date
Jun 15, 2004
Tokyo Ohka Kogyo Co., Ltd.
Hideo Hada
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FO...
Publication number
20100196823
Publication date
Aug 5, 2010
Tokyo Ohka Kogyo Co., Ltd.
Kazuhito Sasaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20090111054
Publication date
Apr 30, 2009
Tokyo Ohka Kogyo Co., Ltd.
Jun Iwashita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition, multilayer body, and method for forming resist...
Publication number
20060154174
Publication date
Jul 13, 2006
Tokyo Ohka Kogyo Co., Ltd.
Hideo Hada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive-working photoresist composition
Publication number
20020068238
Publication date
Jun 6, 2002
Hideo Hada
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC