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Plasma etching system
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Patent number 6,432,261
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Issue date Aug 13, 2002
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Anelva Corporation
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Kazuhito Watanabe
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H01 - BASIC ELECTRIC ELEMENTS
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Gate valve apparatus
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Patent number 6,386,511
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Issue date May 14, 2002
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Anelva Corporation
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Kazuhito Watanabe
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F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
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Substrate processing apparatus
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Patent number 6,129,046
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Issue date Oct 10, 2000
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Anelva Corporation
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Shigeru Mizuno
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Heater for CVD apparatus
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Patent number 5,766,363
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Issue date Jun 16, 1998
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Anelva Corporation
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Shigeru Mizuno
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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CVD apparatus
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Patent number 5,676,758
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Issue date Oct 14, 1997
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Anelva Corporation
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Shinya Hasegawa
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...