Kazuishi TANNO

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,150,554
- Issue date Oct 19, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 11,036,131
- Issue date Jun 15, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,036,132
- Issue date Jun 15, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition and method of forming resist pattern
- Patent number 10,534,263
- Issue date Jan 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 10,534,264
- Issue date Jan 14, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190204735
- Publication date Jul 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190064663
- Publication date Feb 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180299778
- Publication date Oct 18, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20180224742
- Publication date Aug 9, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20180180997
- Publication date Jun 28, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...