Kazuki Kasahara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition and pattern-forming method
- Patent number 10,120,277
- Issue date Nov 6, 2018
- JSR Corporation
- Kazuki Kasahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition and pattern-forming method
- Patent number 10,108,088
- Issue date Oct 23, 2018
- JSR Corporation
- Kazuki Kasahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 10,048,586
- Issue date Aug 14, 2018
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and resist pattern-forming method
- Patent number 9,329,474
- Issue date May 3, 2016
- JSR Corporation
- Kazuki Kasahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and pattern-forming method
- Patent number 9,158,196
- Issue date Oct 13, 2015
- JSR Corporation
- Kazuki Kasahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,104,102
- Issue date Aug 11, 2015
- JSR Corporation
- Yasuhiko Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
- Patent number 9,046,765
- Issue date Jun 2, 2015
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,968,980
- Issue date Mar 3, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist film formed using...
- Patent number 8,609,319
- Issue date Dec 17, 2013
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...
- Publication number 20230103682
- Publication date Apr 6, 2023
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210318613
- Publication date Oct 14, 2021
- JSR Corporation
- Katsuaki NISHIKORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20200393761
- Publication date Dec 17, 2020
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190094691
- Publication date Mar 28, 2019
- JSR Corporation
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190033713
- Publication date Jan 31, 2019
- JSR Corporation
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20180356725
- Publication date Dec 13, 2018
- JSR Corporation
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20170242336
- Publication date Aug 24, 2017
- JSR Corporation
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20170242337
- Publication date Aug 24, 2017
- JSR Corporation
- KAZUKI KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
- Publication number 20140023968
- Publication date Jan 23, 2014
- JSR Corporation
- Hiromitsu NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20130280657
- Publication date Oct 24, 2013
- Kazuki KASAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130216948
- Publication date Aug 22, 2013
- JSR Corporation
- Kazuki KASAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130095428
- Publication date Apr 18, 2013
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120295198
- Publication date Nov 22, 2012
- JSR Corporation
- Yasuhiko MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120183902
- Publication date Jul 19, 2012
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...
- Publication number 20120082935
- Publication date Apr 5, 2012
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- Publication number 20120045719
- Publication date Feb 23, 2012
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110223537
- Publication date Sep 15, 2011
- JSR Corporation
- Takuma Ebata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...
- Publication number 20110212401
- Publication date Sep 1, 2011
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110014569
- Publication date Jan 20, 2011
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kazuki Kasahara

Person

Patents Grantslast 30 patents

Radiation-sensitive composition and pattern-forming method

Radiation-sensitive composition and pattern-forming method

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method for forming resist pa...

Photoresist composition and resist pattern-forming method

Radiation-sensitive resin composition and pattern-forming method

Radiation-sensitive resin composition

Resist pattern-forming method, resist pattern-forming radiation-sen...

Radiation-sensitive resin composition and compound

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and resist film formed using...

Patents Applicationslast 30 patents

METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...

PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER