Kazuma YAMAMOTO

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor aqueous composition and use of the same
- Patent number 12,077,727
- Issue date Sep 3, 2024
- Merck Patent GmbH
- Kazuma Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated imide salt compound and surfactant
- Patent number 11,414,381
- Issue date Aug 16, 2022
- Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Masato Fujita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lithography composition, a method for forming resist patterns and a...
- Patent number 11,156,920
- Issue date Oct 26, 2021
- Merck Patent GmbH
- Kazuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rinse composition, a method for forming resist patterns and a metho...
- Patent number 10,451,974
- Issue date Oct 22, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition for resist patterning and method for forming pattern us...
- Patent number 10,191,380
- Issue date Jan 29, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Fine resist pattern-forming composition and pattern forming method...
- Patent number 9,921,481
- Issue date Mar 20, 2018
- AZ Electronic Materials (Luxembourg) S.à r.l.
- Kazuma Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming fine resist pattern, and pattern formation...
- Patent number 9,411,232
- Issue date Aug 9, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Tatsuro Nagahara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming fine resist pattern and pattern formation m...
- Patent number 9,360,756
- Issue date Jun 7, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming a developable bottom antireflective coating
- Patent number 8,697,336
- Issue date Apr 15, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING...
- Publication number 20240425777
- Publication date Dec 26, 2024
- Merck Patent GmbH
- KAZUMA YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFA...
- Publication number 20240294855
- Publication date Sep 5, 2024
- Merck Patent GmbH
- Kazuma YAMAMOTO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUT...
- Publication number 20240036469
- Publication date Feb 1, 2024
- Merck Patent GmbH
- Tatsuro NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFA...
- Publication number 20230167383
- Publication date Jun 1, 2023
- Merck Patent GmbH
- Kazuma YAMAMOTO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND M...
- Publication number 20230045307
- Publication date Feb 9, 2023
- Merch Patent GmbH
- Kazuma YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR AQUEOUS COMPOSITION AND USE OF THE SAME
- Publication number 20210403829
- Publication date Dec 30, 2021
- Merck Patent GmbH
- Kazuma YAMAMOTO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FLUORINATED IMIDE SALT COMPOUND AND SURFACTANT
- Publication number 20210355080
- Publication date Nov 18, 2021
- MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO., LTD
- Masato FUJITA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
A LITHOGRAPHY COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND...
- Publication number 20190377263
- Publication date Dec 12, 2019
- RIDGEFIELD ACQUISITION
- Kazuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A MET...
- Publication number 20190250515
- Publication date Aug 15, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Kazuma YAMAMOTO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN US...
- Publication number 20170219927
- Publication date Aug 3, 2017
- AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN, AND PATTERN FORMATION...
- Publication number 20160011508
- Publication date Jan 14, 2016
- Tatsuro NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD...
- Publication number 20160002494
- Publication date Jan 7, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma YAMAMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...
- Publication number 20150253669
- Publication date Sep 10, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20140193753
- Publication date Jul 10, 2014
- AZ Electronic Materials USA Corp.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING
- Publication number 20130157196
- Publication date Jun 20, 2013
- AZ Electronic Materials USA Corp.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Kazuma YAMAMOTO

Person

Patents Grantslast 30 patents

Semiconductor aqueous composition and use of the same

Fluorinated imide salt compound and surfactant

Lithography composition, a method for forming resist patterns and a...

Rinse composition, a method for forming resist patterns and a metho...

Composition for resist patterning and method for forming pattern us...

Fine resist pattern-forming composition and pattern forming method...

Composition for forming fine resist pattern, and pattern formation...

Composition for forming fine resist pattern and pattern formation m...

Composition for forming a developable bottom antireflective coating

Patents Applicationslast 30 patents

ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING...

ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFA...

METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUT...

ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFA...

REPLACEMENT LIQUID OF LIQUID FILLING BETWEEN RESIST PATTERNS, AND M...

SEMICONDUCTOR AQUEOUS COMPOSITION AND USE OF THE SAME

FLUORINATED IMIDE SALT COMPOUND AND SURFACTANT

A LITHOGRAPHY COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND...

A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A MET...

COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN US...

COMPOSITION FOR FORMING FINE RESIST PATTERN, AND PATTERN FORMATION...

FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING

COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING