Kazumasa Ohashi

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and produc...
- Patent number 10,337,100
- Issue date Jul 2, 2019
- JX Nippon Mining & Metals Corporation
- Kazumasa Ohashi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Tungsten sputtering target and method for producing same
- Patent number 10,176,974
- Issue date Jan 8, 2019
- JX Nippon Mining & Metals Corporation
- Kazumasa Ohashi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Tungsten sintered compact sputtering target and tungsten film forme...
- Patent number 10,047,433
- Issue date Aug 14, 2018
- JX Nippon Mining & Metals Corporation
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target-backing plate assembly and method for producing same
- Patent number 10,006,117
- Issue date Jun 26, 2018
- JX Nippon Mining & Metals Corporation
- Shiro Tsukamoto
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Tungsten sintered compact sputtering target and method for producin...
- Patent number 9,812,301
- Issue date Nov 7, 2017
- JX Nippon Mining & Metals Corporation
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Ni alloy sputtering target, Ni alloy thin film and Ni silicide film
- Patent number 9,249,497
- Issue date Feb 2, 2016
- JX Nippon Mining & Metals Corporation
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...
- Publication number 20180347031
- Publication date Dec 6, 2018
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...
- Publication number 20180261438
- Publication date Sep 13, 2018
- JX NIPPON MINING & METALS CORPORATION
- Kengo Kaminaga
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Tungsten Sputtering Target And Method For Producing Same
- Publication number 20170211176
- Publication date Jul 27, 2017
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target Comprising Ni-P Alloy or Ni-Pt-P Alloy and Produc...
- Publication number 20170121811
- Publication date May 4, 2017
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET COMPRISING TUNGSTEN CARBIDE OR TITANIUM CARBIDE
- Publication number 20160333460
- Publication date Nov 17, 2016
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN SINTERED COMPACT SPUTTERING TARGET AND METHOD FOR PRODUCIN...
- Publication number 20150357170
- Publication date Dec 10, 2015
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...
- Publication number 20150303040
- Publication date Oct 22, 2015
- JX NIPPON MINING & METALS CORPORATION
- Kengo Kaminaga
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...
- Publication number 20150023837
- Publication date Jan 22, 2015
- JX NIPPON MINING & METALS CORPORATION
- Kazumasa Ohashi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target-Backing Plate Assembly and Method for Producing Same
- Publication number 20130220805
- Publication date Aug 29, 2013
- JX NIPPON MINING & METALS CORPORATION
- Shiro Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ni ALLOY SPUTTERING TARGET, Ni ALLOY THIN FILM AND Ni SILICIDE FILM
- Publication number 20130032477
- Publication date Feb 7, 2013
- JX NIPPON MINING & METALS CORPORATION
- Yasuhiro Yamakoshi
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Kazumasa Ohashi

Person

Patents Grantslast 30 patents

Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and produc...

Tungsten sputtering target and method for producing same

Tungsten sintered compact sputtering target and tungsten film forme...

Sputtering target-backing plate assembly and method for producing same

Tungsten sintered compact sputtering target and method for producin...

Ni alloy sputtering target, Ni alloy thin film and Ni silicide film

Patents Applicationslast 30 patents

Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...

Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...

Tungsten Sputtering Target And Method For Producing Same

Sputtering Target Comprising Ni-P Alloy or Ni-Pt-P Alloy and Produc...

SPUTTERING TARGET COMPRISING TUNGSTEN CARBIDE OR TITANIUM CARBIDE

TUNGSTEN SINTERED COMPACT SPUTTERING TARGET AND METHOD FOR PRODUCIN...

Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...

Tungsten Sintered Compact Sputtering Target and Tungsten Film Forme...

Sputtering Target-Backing Plate Assembly and Method for Producing Same

Ni ALLOY SPUTTERING TARGET, Ni ALLOY THIN FILM AND Ni SILICIDE FILM