Kazumasa Wakiya

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning composition, cleaning method, and method for manufacturing...
- Patent number 11,441,101
- Issue date Sep 13, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Isao Hirano
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Surface treatment liquid, surface treatment method, hydrophobilizat...
- Patent number 9,244,358
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist stripping solution and a method of stripping photoresis...
- Patent number 8,697,345
- Issue date Apr 15, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid used in photolithography and a method for treating...
- Patent number 8,685,910
- Issue date Apr 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Detergent for lithography and method of forming resist pattern with...
- Patent number 8,367,312
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for stripping photoresist
- Patent number 8,354,215
- Issue date Jan 15, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping solution and a method of stripping photoresis...
- Patent number 8,192,923
- Issue date Jun 5, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid used in process for forming dual damascene structur...
- Patent number 8,158,568
- Issue date Apr 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for forming pattern, and material for forming coating film
- Patent number 8,124,312
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic rinse solution and method for forming patterned resist...
- Patent number 7,897,325
- Issue date Mar 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Material for forming resist protective film for use in liquid immer...
- Patent number 7,846,637
- Issue date Dec 7, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern forming method and composite rinse agent
- Patent number 7,811,748
- Issue date Oct 12, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for lithography and method for resist pattern forma...
- Patent number 7,795,197
- Issue date Sep 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing fluid for lithography
- Patent number 7,741,260
- Issue date Jun 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning composition and method of cleaning semiconductor substrate
- Patent number 7,442,675
- Issue date Oct 28, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Material for forming resist protecting film for use in liquid immer...
- Patent number 7,371,510
- Issue date May 13, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating material for wiring, embedded material, and wiring for...
- Patent number 7,238,462
- Issue date Jul 3, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming protective film
- Patent number 7,179,399
- Issue date Feb 20, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid coating composition for forming a top antireflective film an...
- Patent number 7,129,020
- Issue date Oct 31, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing solution for lithography and method for processing substrat...
- Patent number 6,815,151
- Issue date Nov 9, 2004
- Tokyo Ohika Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing coating film and method for manufacturing sem...
- Patent number 6,746,963
- Issue date Jun 8, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective coating composition for dual damascene process
- Patent number 6,734,258
- Issue date May 11, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Anti-reflective coating composition, multilayer photoresist materia...
- Patent number 6,689,535
- Issue date Feb 10, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping solution and a method of stripping photoresis...
- Patent number 6,638,899
- Issue date Oct 28, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a finely patterned photoresist layer
- Patent number 6,599,682
- Issue date Jul 29, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for lithographic anti-reflection coating, and resist la...
- Patent number 6,416,930
- Issue date Jul 9, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,291,142
- Issue date Sep 18, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating liquid compositions and a process for treatmen...
- Patent number 6,261,745
- Issue date Jul 17, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,225,034
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating method for substrates
- Patent number 6,225,030
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR...
- Publication number 20240395538
- Publication date Nov 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takumi NAMIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE
- Publication number 20240199913
- Publication date Jun 20, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Fusayo SAEKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RINSING SOLUTION, METHOD OF TREATING SUBSTRATE, AND METHOD OF MANUF...
- Publication number 20230265362
- Publication date Aug 24, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yukihisa WADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE
- Publication number 20230203408
- Publication date Jun 29, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yukihisa WADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE
- Publication number 20230203409
- Publication date Jun 29, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yukihisa WADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION, CLEANING METHOD, AND METHOD FOR MANUFACTURING...
- Publication number 20210284930
- Publication date Sep 16, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Isao HIRANO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZAT...
- Publication number 20110195190
- Publication date Aug 11, 2011
- TOKYO OHKA KOGYO CO., LTD.
- Jun Koshiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR STRIPPING PHOTORESIST
- Publication number 20110000874
- Publication date Jan 6, 2011
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID USED IN PHOTOLITHOGRAPHY AND A METHOD FOR TREATING...
- Publication number 20100304312
- Publication date Dec 2, 2010
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL
- Publication number 20100255429
- Publication date Oct 7, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20100248477
- Publication date Sep 30, 2010
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20100190112
- Publication date Jul 29, 2010
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20100112495
- Publication date May 6, 2010
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...
- Publication number 20100090372
- Publication date Apr 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20100051582
- Publication date Mar 4, 2010
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating liquid for photoresist removal and method for treating sub...
- Publication number 20100056411
- Publication date Mar 4, 2010
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for stripping photoresist
- Publication number 20090291565
- Publication date Nov 26, 2009
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20090176677
- Publication date Jul 9, 2009
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20090156005
- Publication date Jun 18, 2009
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHO...
- Publication number 20090011375
- Publication date Jan 8, 2009
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20090011601
- Publication date Jan 8, 2009
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Detergent For Lithography And Method Of Forming Resist Pattern With...
- Publication number 20090004608
- Publication date Jan 1, 2009
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for stripping photoresist
- Publication number 20080280452
- Publication date Nov 13, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20080241758
- Publication date Oct 2, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20080242575
- Publication date Oct 2, 2008
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing Liquid for Lithography and Method for Resist Pattern Forma...
- Publication number 20080193876
- Publication date Aug 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Liquid For Lithography And Method For Resist Pattern Forma...
- Publication number 20080096141
- Publication date Apr 24, 2008
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material for Forming Resist Protective Film for Use in Liquid Immer...
- Publication number 20080032202
- Publication date Feb 7, 2008
- Keita Ishizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Rinsing Fluid for Lithography
- Publication number 20080026975
- Publication date Jan 31, 2008
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20080011714
- Publication date Jan 17, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazumasa Wakiya

Person

Patents Grantslast 30 patents

Cleaning composition, cleaning method, and method for manufacturing...

Surface treatment liquid, surface treatment method, hydrophobilizat...

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in photolithography and a method for treating...

Detergent for lithography and method of forming resist pattern with...

Method for stripping photoresist

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in process for forming dual damascene structur...

Method for forming pattern, and material for forming coating film

Lithographic rinse solution and method for forming patterned resist...

Material for forming resist protective film for use in liquid immer...

Resist pattern forming method and composite rinse agent

Cleaning liquid for lithography and method for resist pattern forma...

Rinsing fluid for lithography

Cleaning composition and method of cleaning semiconductor substrate

Material for forming resist protecting film for use in liquid immer...

Undercoating material for wiring, embedded material, and wiring for...

Material for forming protective film

Liquid coating composition for forming a top antireflective film an...

Rinsing solution for lithography and method for processing substrat...

Method for processing coating film and method for manufacturing sem...

Protective coating composition for dual damascene process

Anti-reflective coating composition, multilayer photoresist materia...

Photoresist stripping solution and a method of stripping photoresis...

Method for forming a finely patterned photoresist layer

Composition for lithographic anti-reflection coating, and resist la...

Photoresist stripping liquid compositions and a method of stripping...

Post-ashing treating liquid compositions and a process for treatmen...

Photoresist stripping liquid compositions and a method of stripping...

Post-ashing treating method for substrates

Patents Applicationslast 30 patents

METHOD FOR PROCESSING SUBSTRATE, CHEMICAL SOLUTION, AND METHOD FOR...

METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE

RINSING SOLUTION, METHOD OF TREATING SUBSTRATE, AND METHOD OF MANUF...

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

CLEANING COMPOSITION, CLEANING METHOD, AND METHOD FOR MANUFACTURING...

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZAT...

METHOD FOR STRIPPING PHOTORESIST

CLEANING LIQUID USED IN PHOTOLITHOGRAPHY AND A METHOD FOR TREATING...

FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL

Cleaning liquid used in process for forming dual damascene structur...

Photoresist stripping solution and a method of stripping photoresis...

Photoresist stripping solution and a method of stripping photoresis...

COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPAT...

Cleaning liquid used in process for forming dual damascene structur...

Treating liquid for photoresist removal and method for treating sub...

Method for stripping photoresist

Treating liquid for photoresist removal, and method for treating su...

Cleaning liquid used in process for forming dual damascene structur...

IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHO...

Over-coating agent for forming fine patterns and a method of formin...

Detergent For Lithography And Method Of Forming Resist Pattern With...

Method for stripping photoresist

Photoresist stripping solution and a method of stripping photoresis...

Treating liquid for photoresist removal, and method for treating su...

Rinsing Liquid for Lithography and Method for Resist Pattern Forma...

Cleaning Liquid For Lithography And Method For Resist Pattern Forma...

Material for Forming Resist Protective Film for Use in Liquid Immer...

Rinsing Fluid for Lithography

Photoresist stripping solution and a method of stripping photoresis...