Kazumi Asada

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Post-dry etching cleaning liquid composition and process for fabric...
- Patent number 8,513,140
- Issue date Aug 20, 2013
- Sony Corporation
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist stripping method and resist stripping apparatus
- Patent number 7,682,463
- Issue date Mar 23, 2010
- Dainippon Screen Mfg. Co., Ltd.
- Atsushi Okuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Separation-material composition for photo-resist and manufacturing...
- Patent number 7,341,827
- Issue date Mar 11, 2008
- Sony Corporation
- Masafumi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,815,289
- Issue date Nov 9, 2004
- Sony Corporation
- Tomoyuki Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying semiconductor substrate
- Patent number 6,158,141
- Issue date Dec 12, 2000
- Sony Corporation
- Kazumi Asada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20110014793
- Publication date Jan 20, 2011
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20080188085
- Publication date Aug 7, 2008
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Separation-material composition for photo-resist and manufacturing...
- Publication number 20080076260
- Publication date Mar 27, 2008
- SONY CORPORATION
- Masafumi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20060019201
- Publication date Jan 26, 2006
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Single wafer cleaning apparatus and cleaning method thereof
- Publication number 20050252526
- Publication date Nov 17, 2005
- SONY CORPORATION
- Naoki Ogawa
- B08 - CLEANING
Information Patent Application
Resist stripping method and resist stripping apparatus
- Publication number 20050205115
- Publication date Sep 22, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Atsushi Okuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20040241935
- Publication date Dec 2, 2004
- Tomoyuki Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Separation-material composition for photo-resist and manufacturing...
- Publication number 20040038154
- Publication date Feb 26, 2004
- Masafumi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20020098646
- Publication date Jul 25, 2002
- Tomoyuki Hirano
- H01 - BASIC ELECTRIC ELEMENTS

Kazumi Asada

Person

Patents Grantslast 30 patents

Post-dry etching cleaning liquid composition and process for fabric...

Resist stripping method and resist stripping apparatus

Separation-material composition for photo-resist and manufacturing...

Method of manufacturing semiconductor device

Apparatus and method for drying semiconductor substrate

Patents Applicationslast 30 patents

Post-dry etching cleaning liquid composition and process for fabric...

Post-dry etching cleaning liquid composition and process for fabric...

Separation-material composition for photo-resist and manufacturing...

Post-dry etching cleaning liquid composition and process for fabric...

Single wafer cleaning apparatus and cleaning method thereof

Resist stripping method and resist stripping apparatus

Method of manufacturing semiconductor device

Separation-material composition for photo-resist and manufacturing...

Method of manufacturing semiconductor device