Kazumi Iwadate

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Patents Grantslast 30 patents

Information Patent Grant
Highly sensitive positive resist mixture
- Patent number 4,820,609
- Issue date Apr 11, 1989
- Nippon Telegraph & Telephone Corporation
- Kazumi Iwadate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mark position detection system for use in charged particle beam app...
- Patent number 4,808,829
- Issue date Feb 28, 1989
- Hitachi Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning method
- Patent number 4,699,870
- Issue date Oct 13, 1987
- Nippon Telegraph & Telephone Corporation
- Kazumi Iwadate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography apparatus
- Patent number 4,692,579
- Issue date Sep 8, 1987
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY