Kazumi Kubo

Person

Esashi-Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition method
- Patent number 11,952,661
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method
- Patent number 11,404,265
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazumi Kubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 11,075,074
- Issue date Jul 27, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 10,748,758
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 10,643,837
- Issue date May 5, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method of depositing film and film deposition appar...
- Patent number 10,636,648
- Issue date Apr 28, 2020
- Tokyo Electron Limited
- Kazumi Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming oxide film on carbon film
- Patent number 8,518,834
- Issue date Aug 27, 2013
- Tokyo Electron Limited
- Akinobu Kakimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,696,106
- Issue date Apr 13, 2010
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,637,268
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming dielectric film
- Patent number 7,105,362
- Issue date Sep 12, 2006
- Tokyo Electron Limited
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication process of a semiconductor device
- Patent number 6,953,731
- Issue date Oct 11, 2005
- Tokyo Electron Limited
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250043414
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Kazumi KUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240124976
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Kazumi KUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD
- Publication number 20200243330
- Publication date Jul 30, 2020
- TOKYO ELECTRON LIMITED
- Kazumi KUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD
- Publication number 20200017968
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD OF DEPOSITING FILM AND FILM DEPOSITION APPAR...
- Publication number 20190172700
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Kazumi KUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...
- Publication number 20190051513
- Publication date Feb 14, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...
- Publication number 20190051512
- Publication date Feb 14, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...
- Publication number 20190051511
- Publication date Feb 14, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING M...
- Publication number 20170278699
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Takahito Kasai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING OXIDE FILM ON CARBON FILM
- Publication number 20120164844
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING A THIN FILM FORMING APPARATUS, THIN FILM FORMING...
- Publication number 20120015525
- Publication date Jan 19, 2012
- TOKYO ELECTRON LIMITED
- Atsushi ENDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20090029562
- Publication date Jan 29, 2009
- TOKYO ELECTRON LIMITED
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20060288935
- Publication date Dec 28, 2006
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming dielectric film
- Publication number 20060008969
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fabrication process of a semiconductor device
- Publication number 20030236001
- Publication date Dec 25, 2003
- TOKYO ELECTRON LIMITED
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kazumi Kubo

Person

Patents Grantslast 30 patents

Deposition method

Film deposition method

Method for depositing a silicon nitride film and film deposition ap...

Method for depositing a silicon nitride film and film deposition ap...

Method for depositing a silicon nitride film and film deposition ap...

Film deposition method of depositing film and film deposition appar...

Method and apparatus for forming oxide film on carbon film

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process

Method of forming dielectric film

Fabrication process of a semiconductor device

Patents Applicationslast 30 patents

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM DEPOSITION METHOD

DEPOSITION METHOD

FILM DEPOSITION METHOD OF DEPOSITING FILM AND FILM DEPOSITION APPAR...

METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...

METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...

METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...

CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING M...

METHOD AND APPARATUS FOR FORMING OXIDE FILM ON CARBON FILM

METHOD OF CLEANING A THIN FILM FORMING APPARATUS, THIN FILM FORMING...

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process

Method of forming dielectric film

Fabrication process of a semiconductor device