Kazunaga ONO

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming position misalignment correction method and film formi...
- Patent number 12,180,580
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film thickness measurement method, film thickness measurement devic...
- Patent number 12,018,928
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Kazunaga Ono
- G01 - MEASURING TESTING
Information Patent Grant
Film thickness measuring apparatus and film thickness measuring met...
- Patent number 11,939,665
- Issue date Mar 26, 2024
- Tokyo Electron Limted
- Masato Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering method and sputtering apparatus
- Patent number 11,404,255
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazunaga Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMI...
- Publication number 20240011148
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Atsushi TAKEUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT DEVIC...
- Publication number 20230011226
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- G01 - MEASURING TESTING
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20220098717
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Kenichi IMAKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING MET...
- Publication number 20210285096
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING METHOD AND SPUTTERING APPARATUS
- Publication number 20210082675
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATION PROCESSING MODULE, SUBSTRATE PROCESSING SYSTEM, AND OXIDA...
- Publication number 20200123649
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS
- Publication number 20160071707
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Shinji FURUKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20150114835
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Atsushi GOMI
- H01 - BASIC ELECTRIC ELEMENTS

Kazunaga ONO

Person

Patents Grantslast 30 patents

Film forming position misalignment correction method and film formi...

Film thickness measurement method, film thickness measurement devic...

Film thickness measuring apparatus and film thickness measuring met...

Sputtering method and sputtering apparatus

Patents Applicationslast 30 patents

FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMI...

FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT DEVIC...

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM THICKNESS MEASURING APPARATUS AND FILM THICKNESS MEASURING MET...

SPUTTERING METHOD AND SPUTTERING APPARATUS

OXIDATION PROCESSING MODULE, SUBSTRATE PROCESSING SYSTEM, AND OXIDA...

PROCESSING APPARATUS

FILM FORMING APPARATUS