Kazunori SAKAI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition, film, film-forming method and patterned substrate-prod...
- Patent number 11,667,620
- Issue date Jun 6, 2023
- JSR Corporation
- Hiroki Nakatsu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,320,739
- Issue date May 3, 2022
- JSR Corporation
- Goji Wakamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,215,928
- Issue date Jan 4, 2022
- JSR Corporation
- Kazunori Takanashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,126,084
- Issue date Sep 21, 2021
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition, resist underlayer film,...
- Patent number 10,520,814
- Issue date Dec 31, 2019
- JSR Corporation
- Masayuki Miyake
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 10,053,539
- Issue date Aug 21, 2018
- JSR Corporation
- Shin-ya Nakafuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 9,620,378
- Issue date Apr 11, 2017
- JSR Corporation
- Shin-ya Nakafuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240030030
- Publication date Jan 25, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240021429
- Publication date Jan 18, 2024
- JSR Corporation
- Ken MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- Publication number 20240004297
- Publication date Jan 4, 2024
- JSR Corporation
- Tatsuya KASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRO...
- Publication number 20230069221
- Publication date Mar 2, 2023
- JSR Corporation
- Tomoaki SEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTER...
- Publication number 20220204535
- Publication date Jun 30, 2022
- JSR Corporation
- Yuusuke OOTSUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING...
- Publication number 20220075267
- Publication date Mar 10, 2022
- JSR Corporation
- Yuusuke OOTSUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION, METHOD OF PRODUCING SUBSTRATE, METHOD OF FORMING PATTE...
- Publication number 20210318619
- Publication date Oct 14, 2021
- JSR Corporation
- Yuusuke OOTSUBO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20210181627
- Publication date Jun 17, 2021
- JSR Corporation
- Kazunori SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20210063872
- Publication date Mar 4, 2021
- JSR Corporation
- Kazunori SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND COMPOUND
- Publication number 20200387068
- Publication date Dec 10, 2020
- JSR Corporation
- Kazunori Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION, FILM, FILM-FORMING METHOD AND PATTERNED SUBSTRATE-PROD...
- Publication number 20200199093
- Publication date Jun 25, 2020
- JSR Corporation
- Hiroki NAKATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190258162
- Publication date Aug 22, 2019
- JSR Corporation
- Kazunori Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190258161
- Publication date Aug 22, 2019
- JSR Corporation
- Kazunori SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20190243247
- Publication date Aug 8, 2019
- JSR Corporation
- Naoya NOSAKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20190212650
- Publication date Jul 11, 2019
- JSR Corporation
- Kazunori TAKANASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20180348633
- Publication date Dec 6, 2018
- JSR Corporation
- Goji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20180114698
- Publication date Apr 26, 2018
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...
- Publication number 20180046081
- Publication date Feb 15, 2018
- JSR Corporation
- Masayuki MIYAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20170154782
- Publication date Jun 1, 2017
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS

Kazunori SAKAI

Person

Patents Grantslast 30 patents

Composition, film, film-forming method and patterned substrate-prod...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Resist underlayer film-forming composition, resist underlayer film,...

Composition for film formation, film, production method of patterne...

Composition for film formation, film, production method of patterne...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRO...

COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTER...

FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING...

COMPOSITION, METHOD OF PRODUCING SUBSTRATE, METHOD OF FORMING PATTE...

PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND COMPOUND

COMPOSITION, FILM, FILM-FORMING METHOD AND PATTERNED SUBSTRATE-PROD...

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...