Kazunori Takanashi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition, film, film-forming method and patterned substrate-prod...
- Patent number 11,667,620
- Issue date Jun 6, 2023
- JSR Corporation
- Hiroki Nakatsu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,454,890
- Issue date Sep 27, 2022
- JSR Corporation
- Naoya Nosaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,402,757
- Issue date Aug 2, 2022
- JSR Corporation
- Naoya Nosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,215,928
- Issue date Jan 4, 2022
- JSR Corporation
- Kazunori Takanashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition, resist underlayer film,...
- Patent number 10,520,814
- Issue date Dec 31, 2019
- JSR Corporation
- Masayuki Miyake
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Inorganic film-forming composition for multilayer resist processes,...
- Patent number 10,090,163
- Issue date Oct 2, 2018
- JSR Corporation
- Hisashi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern-forming method
- Patent number 10,025,188
- Issue date Jul 17, 2018
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 9,891,526
- Issue date Feb 13, 2018
- JSR Corporation
- Shunsuke Kurita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern, and polysiloxane composition
- Patent number 9,434,609
- Issue date Sep 6, 2016
- JSR Corporation
- Satoshi Dei
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polysiloxane composition and pattern-forming method
- Patent number 9,329,478
- Issue date May 3, 2016
- JSR Corporation
- Yusuke Anno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 9,170,492
- Issue date Oct 27, 2015
- JSR Corporation
- Tomoharu Kawazu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 9,140,985
- Issue date Sep 22, 2015
- JSR Corporation
- Tomoharu Kawazu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming resist underlayer film and pattern-forming...
- Patent number 9,116,427
- Issue date Aug 25, 2015
- JSR Corporation
- Shunsuke Kurita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 8,993,223
- Issue date Mar 31, 2015
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern, and composition for forming resi...
- Patent number 8,956,807
- Issue date Feb 17, 2015
- JSR Corporation
- Hiromitsu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer resist process pattern-forming method and multilayer res...
- Patent number 8,927,201
- Issue date Jan 6, 2015
- JSR Corporation
- Kazunori Takanashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 8,669,042
- Issue date Mar 11, 2014
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTER...
- Publication number 20230242787
- Publication date Aug 3, 2023
- JSR Corporation
- Kazunori TAKANASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...
- Publication number 20230041656
- Publication date Feb 9, 2023
- JSR Corporation
- Yugaku TAKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD...
- Publication number 20220197144
- Publication date Jun 23, 2022
- JSR Corporation
- Naoya NOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING RESIST UNDER...
- Publication number 20220011672
- Publication date Jan 13, 2022
- JSR Corporation
- Shin-ya NAKAFUJI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND SUBSTRATE-TREATING METHOD
- Publication number 20210115221
- Publication date Apr 22, 2021
- JSR Corporation
- Shun Aoki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION, FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE
- Publication number 20200348595
- Publication date Nov 5, 2020
- JSR Corporation
- Shin-ya NAKAFUJI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20200272053
- Publication date Aug 27, 2020
- JSR Corporation
- Naoya NOSAKA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION, FILM, FILM-FORMING METHOD AND PATTERNED SUBSTRATE-PROD...
- Publication number 20200199093
- Publication date Jun 25, 2020
- JSR Corporation
- Hiroki NAKATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20190212650
- Publication date Jul 11, 2019
- JSR Corporation
- Kazunori TAKANASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...
- Publication number 20180046081
- Publication date Feb 15, 2018
- JSR Corporation
- Masayuki MIYAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170322492
- Publication date Nov 9, 2017
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160320705
- Publication date Nov 3, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20160131978
- Publication date May 12, 2016
- JSR Corporation
- Shunsuke Kurita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160097978
- Publication date Apr 7, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...
- Publication number 20150364332
- Publication date Dec 17, 2015
- JSR Corporation
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150160556
- Publication date Jun 11, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150050600
- Publication date Feb 19, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION
- Publication number 20150048046
- Publication date Feb 19, 2015
- JSR Corporation
- Satoshi DEI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20140134544
- Publication date May 15, 2014
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RES...
- Publication number 20140030660
- Publication date Jan 30, 2014
- JSR Corporation
- Kazunori TAKANASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...
- Publication number 20130233825
- Publication date Sep 12, 2013
- JSR Corporation
- Shunsuke KURITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130130179
- Publication date May 23, 2013
- JSR Corporation
- Yusuke ANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESI...
- Publication number 20130101942
- Publication date Apr 25, 2013
- JSR Corporation
- Hiromitsu TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20120183908
- Publication date Jul 19, 2012
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...
- Publication number 20100233632
- Publication date Sep 16, 2010
- JSR Corporation
- Tomoharu KAWAZU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kazunori Takanashi

Person

Patents Grantslast 30 patents

Composition, film, film-forming method and patterned substrate-prod...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Resist underlayer film-forming composition, resist underlayer film,...

Inorganic film-forming composition for multilayer resist processes,...

Resist pattern-forming method

Pattern forming method

Method for forming pattern, and polysiloxane composition

Polysiloxane composition and pattern-forming method

Silicon-containing film-forming composition, silicon-containing fil...

Silicon-containing film-forming composition, silicon-containing fil...

Composition for forming resist underlayer film and pattern-forming...

Resist pattern-forming method

Method for forming resist pattern, and composition for forming resi...

Multilayer resist process pattern-forming method and multilayer res...

Resist pattern-forming method

Patents Applicationslast 30 patents

METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTER...

COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...

COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD...

COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING RESIST UNDER...

COMPOSITION AND SUBSTRATE-TREATING METHOD

COMPOSITION, FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION, FILM, FILM-FORMING METHOD AND PATTERNED SUBSTRATE-PROD...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

PATTERN FORMING METHOD

RESIST PATTERN-FORMING METHOD

INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

METHOD FOR FORMING PATTERN, AND POLYSILOXANE COMPOSITION

RESIST PATTERN-FORMING METHOD

MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RES...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...

POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD

METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESI...

RESIST PATTERN-FORMING METHOD

SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...