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Kazuo Eguchi
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Yamanashi-ken, JP
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last 30 patents
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Patent Grant
Method and devices for detecting the end point of plasma process
Patent number
5,728,253
Issue date
Mar 17, 1998
Tokyo Electron Limited
Susumu Saito
B81 - MICRO-STRUCTURAL TECHNOLOGY
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Patent Grant
Plasma process apparatus
Patent number
5,717,294
Issue date
Feb 10, 1998
Kabushiki Kaisha Toshiba
Itsuko Sakai
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Method and device for detecting the end point of plasma process
Patent number
5,565,114
Issue date
Oct 15, 1996
Tokyo Electron Limited
Susumu Saito
G01 - MEASURING TESTING