Kazuo Nakahara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 10,048,586
- Issue date Aug 14, 2018
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, resist pattern-forming method, compound, a...
- Patent number 9,323,146
- Issue date Apr 26, 2016
- JSR Corporation
- Hayato Namai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 9,304,393
- Issue date Apr 5, 2016
- JSR Corporation
- Kazuo Nakahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Multilayer resist process pattern-forming method and multilayer res...
- Patent number 8,927,201
- Issue date Jan 6, 2015
- JSR Corporation
- Kazunori Takanashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,895,223
- Issue date Nov 25, 2014
- JSR Corporation
- Mitsuo Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,697,335
- Issue date Apr 15, 2014
- JSR Corporation
- Kazuo Nakahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist lower layer film-forming composition, polymer, resist lower...
- Patent number 8,647,810
- Issue date Feb 11, 2014
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, polymer and compound
- Patent number 8,609,321
- Issue date Dec 17, 2013
- JSP Corporation
- Hiromitsu Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,609,318
- Issue date Dec 17, 2013
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, polymer and compound
- Patent number 8,603,726
- Issue date Dec 10, 2013
- JSR Corporation
- Kazuo Nakahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,273,521
- Issue date Sep 25, 2012
- JSR Corporation
- Mitsuo Sato
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...
- Publication number 20140363769
- Publication date Dec 11, 2014
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RES...
- Publication number 20140030660
- Publication date Jan 30, 2014
- JSR Corporation
- Kazunori TAKANASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- Publication number 20130288179
- Publication date Oct 31, 2013
- Kazuo NAKAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
- Publication number 20130189621
- Publication date Jul 25, 2013
- JSR Corporation
- Hiromitsu NAKASHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130095428
- Publication date Apr 18, 2013
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...
- Publication number 20130045446
- Publication date Feb 21, 2013
- JSR Corporation
- Mitsuo SATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120219903
- Publication date Aug 30, 2012
- JSR Corporation
- Mitsuo SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- Publication number 20120148952
- Publication date Jun 14, 2012
- JSR Corporation
- Kazuo NAKAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
- Publication number 20120082934
- Publication date Apr 5, 2012
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST LOWER LAYER FILM-FORMING COMPOSITION, POLYMER, RESIST LOWER...
- Publication number 20120077124
- Publication date Mar 29, 2012
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120034560
- Publication date Feb 9, 2012
- JSR Corporation
- Kazuo NAKAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
- Publication number 20110027718
- Publication date Feb 3, 2011
- JSR Corporation
- Mitsuo SATO
- C07 - ORGANIC CHEMISTRY

Kazuo Nakahara

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method for forming resist pa...

Photoresist composition, resist pattern-forming method, compound, a...

Radiation-sensitive resin composition and compound

Multilayer resist process pattern-forming method and multilayer res...

Radiation-sensitive resin composition

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and compound

Resist lower layer film-forming composition, polymer, resist lower...

Radiation-sensitive resin composition, polymer and compound

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, polymer and compound

Radiation-sensitive resin composition and compound

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

MULTILAYER RESIST PROCESS PATTERN-FORMING METHOD AND MULTILAYER RES...

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND

RESIST LOWER LAYER FILM-FORMING COMPOSITION, POLYMER, RESIST LOWER...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND