Kazutaka Ishigo

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern accuracy detecting apparatus and processing system
- Patent number 9,941,177
- Issue date Apr 10, 2018
- TOSHIBA MEMORY CORPORATION
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay/alignment measurement method and overlay/alignment measurem...
- Patent number 9,250,542
- Issue date Feb 2, 2016
- Kabushiki Kaisha Toshiba
- Kazutaka Ishigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure control system, and exposure method
- Patent number 9,158,212
- Issue date Oct 13, 2015
- Kabushiki Kaisha Toshiba
- Kazutaka Ishigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for fabricating semiconductor device
- Patent number 8,790,851
- Issue date Jul 29, 2014
- Kabushiki Kaisha Toshiba
- Yosuke Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mark arrangement inspecting method, mask data, and manufacturing me...
- Patent number 8,364,437
- Issue date Jan 29, 2013
- Kabushiki Kaisha Toshiba
- Hiroyuki Morinaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern monitor mark and monitoring method suitable for micropattern
- Patent number 8,072,601
- Issue date Dec 6, 2011
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, pattern designing method, and mask set
- Patent number 8,034,515
- Issue date Oct 11, 2011
- Kabushiki Kaisha Toshiba
- Kazutaka Ishigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 7,973,419
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Tomoyasu Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, photomask superimposition correcting method, and manufac...
- Patent number 7,906,258
- Issue date Mar 15, 2011
- Kabushiki Kaisha Toshiba
- Nobuhiro Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM
- Publication number 20170271214
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Kentaro KASA
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE SYSTEM AND EXPOSURE METHOD
- Publication number 20140285787
- Publication date Sep 25, 2014
- KABUSHIKI KAISHA TOSHIBA
- Eiji YONEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20130252429
- Publication date Sep 26, 2013
- KABUSHIKI KAISHA TOSHIBA
- Yosuke OKAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE CONTROL SYSTEM, AND EXPOSURE METHOD
- Publication number 20130222777
- Publication date Aug 29, 2013
- KABUSHIKI KAISHA TOSHIBA
- Kazutaka ISHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY/ALIGNMENT MEASUREMENT METHOD AND OVERLAY/ALIGNMENT MEASUREM...
- Publication number 20120069337
- Publication date Mar 22, 2012
- Kazutaka ISHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, PATTERN DESIGNING METHOD, AND MASK SET
- Publication number 20100291477
- Publication date Nov 18, 2010
- Kabushiki Kaisha Toshiba
- Kazutaka ISHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK ARRANGEMENT INSPECTING METHOD, MASK DATA, AND MANUFACTURING ME...
- Publication number 20100211352
- Publication date Aug 19, 2010
- Hiroyuki MORINAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK, PHOTOMASK SUPERIMPOSITION CORRECTING METHOD, AND MANUFAC...
- Publication number 20080225254
- Publication date Sep 18, 2008
- Nobuhiro KOMINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Monitor Mark and Monitoring Method Suitable for Micropattern
- Publication number 20080206898
- Publication date Aug 28, 2008
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20070090549
- Publication date Apr 26, 2007
- Tomoyasu Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazutaka Ishigo

Person

Patents Grantslast 30 patents

Pattern accuracy detecting apparatus and processing system

Overlay/alignment measurement method and overlay/alignment measurem...

Exposure apparatus, exposure control system, and exposure method

Mask and method for fabricating semiconductor device

Mark arrangement inspecting method, mask data, and manufacturing me...

Pattern monitor mark and monitoring method suitable for micropattern

Pattern forming method, pattern designing method, and mask set

Semiconductor device and method of fabricating the same

Photomask, photomask superimposition correcting method, and manufac...

Patents Applicationslast 30 patents

PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM

EXPOSURE SYSTEM AND EXPOSURE METHOD

MASK AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

EXPOSURE APPARATUS, EXPOSURE CONTROL SYSTEM, AND EXPOSURE METHOD

OVERLAY/ALIGNMENT MEASUREMENT METHOD AND OVERLAY/ALIGNMENT MEASUREM...

PATTERN FORMING METHOD, PATTERN DESIGNING METHOD, AND MASK SET

MARK ARRANGEMENT INSPECTING METHOD, MASK DATA, AND MANUFACTURING ME...

PHOTOMASK, PHOTOMASK SUPERIMPOSITION CORRECTING METHOD, AND MANUFAC...

Pattern Monitor Mark and Monitoring Method Suitable for Micropattern

Semiconductor device and method of fabricating the same