Kazutake Taniguchi

Person

Hokuto-City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
- Patent number 11,624,979
- Issue date Apr 11, 2023
- Hoya Corporation
- Kazutake Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, and method of manufacturing semiconducto...
- Patent number 11,314,162
- Issue date Apr 26, 2022
- Hoya Corporation
- Kazutake Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,314,161
- Issue date Apr 26, 2022
- Hoya Corporation
- Hiroaki Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,022,875
- Issue date Jun 1, 2021
- Hoya Corporation
- Kazutake Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK AND REFLECTIVE MASK
- Publication number 20240094621
- Publication date Mar 21, 2024
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20230069092
- Publication date Mar 2, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20220206381
- Publication date Jun 30, 2022
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20210141305
- Publication date May 13, 2021
- HOYA CORPORATION
- Kazutake TANIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20210048740
- Publication date Feb 18, 2021
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20200409252
- Publication date Dec 31, 2020
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190302604
- Publication date Oct 3, 2019
- HOYA CORPORATION
- Yasutaka HORIGOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLD BLANK, MASTER MOLD, METHOD OF MANUFACTURING COPY MOLD AND MOLD...
- Publication number 20140234468
- Publication date Aug 21, 2014
- HOYA CORPORATION
- Kazutake Taniguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
FUNCTIONALLY GRADIENT INORGANIC RESIST, SUBSTRATE WITH FUNCTIONALLY...
- Publication number 20120135353
- Publication date May 31, 2012
- HOYA CORPORATION
- Isao Amemiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazutake Taniguchi

Person

Patents Grantslast 30 patents

Mask blank, transfer mask, and method of manufacturing semiconducto...

Mask blank, transfer mask, and method of manufacturing semiconducto...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Patents Applicationslast 30 patents

MASK BLANK AND REFLECTIVE MASK

MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

MOLD BLANK, MASTER MOLD, METHOD OF MANUFACTURING COPY MOLD AND MOLD...

FUNCTIONALLY GRADIENT INORGANIC RESIST, SUBSTRATE WITH FUNCTIONALLY...