Kazuto MATSUKI

Person

Ota Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method
- Patent number 10,018,915
- Issue date Jul 10, 2018
- TOSHIBA MEMORY CORPORATION
- Kazuto Matsuki
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Electron beam irradiation device
- Patent number 9,960,007
- Issue date May 1, 2018
- TOSHIBA MEMORY CORPORATION
- Kazuto Matsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding apparatus, pattern transfer apparatus, and patter...
- Patent number 9,188,879
- Issue date Nov 17, 2015
- Kabushiki Kaisha Toshiba
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating laser light source
- Patent number 7,539,222
- Issue date May 26, 2009
- Advanced Mask Inspection Technology Inc.
- Kazuto Matsuki
- G02 - OPTICS
Information Patent Grant
Pattern inspecting method and pattern inspecting apparatus
- Patent number 7,359,043
- Issue date Apr 15, 2008
- Kabushiki Kaisha Toshiba
- Hideo Tsuchiya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam exposure apparatus
- Patent number 6,319,642
- Issue date Nov 20, 2001
- Kabushiki Kaisha Toshiba
- Shigehiro Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam lithography system
- Patent number 6,313,476
- Issue date Nov 6, 2001
- Kabushiki Kaisha Toshiba
- Mitsuko Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming apparatus
- Patent number 6,182,369
- Issue date Feb 6, 2001
- Kabushiki Kaisha Toshiba
- Ryoichi Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,912,468
- Issue date Jun 15, 1999
- Kabushiki Kaisha Toshiba
- Ryoichi Hirano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam drawing method
- Patent number 5,894,057
- Issue date Apr 13, 1999
- Kabushiki Kaisha Toshiba
- Toshio Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography apparatus and method
- Patent number 5,760,410
- Issue date Jun 2, 1998
- Kabushiki Kaisha Toshiba
- Kazuto Matsuki
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
TEMPLATE, METHOD OF FABRICATING TEMPLATE, AND METHOD OF MANUFACTURI...
- Publication number 20190287794
- Publication date Sep 19, 2019
- Toshiba Memory Corporation
- Kaori UMEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170178896
- Publication date Jun 22, 2017
- Kabushiki Kaisha Toshiba
- Kazuto MATSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20170076907
- Publication date Mar 16, 2017
- Kabushiki Kaisha Toshiba
- Kazuto MATSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...
- Publication number 20130222782
- Publication date Aug 29, 2013
- Kentaro KASA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN INSPECTION APPARATUS
- Publication number 20120081538
- Publication date Apr 5, 2012
- Kabushiki Kaisha Toshiba
- Riki Ogawa
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPERATING LASER LIGHT SOURCE
- Publication number 20070071042
- Publication date Mar 29, 2007
- Advanced Mask Inspection Technology Inc.
- Kazuto Matsuki
- G02 - OPTICS
Information Patent Application
Pattern inspecting method and pattern inspecting apparatus
- Publication number 20040184652
- Publication date Sep 23, 2004
- Hideo Tsuchiya
- G06 - COMPUTING CALCULATING COUNTING

Kazuto MATSUKI

Person

Patents Grantslast 30 patents

Pattern forming method

Electron beam irradiation device

Substrate holding apparatus, pattern transfer apparatus, and patter...

Method of operating laser light source

Pattern inspecting method and pattern inspecting apparatus

Electron beam exposure apparatus

Charged beam lithography system

Pattern forming apparatus

Charged particle beam exposure system

Charged beam drawing method

Electron beam lithography apparatus and method

Patents Applicationslast 30 patents

TEMPLATE, METHOD OF FABRICATING TEMPLATE, AND METHOD OF MANUFACTURI...

PATTERN FORMING METHOD

ELECTRON BEAM IRRADIATION DEVICE

SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTER...

PATTERN INSPECTION APPARATUS

METHOD OF OPERATING LASER LIGHT SOURCE

Pattern inspecting method and pattern inspecting apparatus