Kazuya Fukuhara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint apparatus and imprint method
- Patent number 12,078,925
- Issue date Sep 3, 2024
- Kioxia Corporation
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprinting device, imprinting method, and method for manufacturing...
- Patent number 12,050,401
- Issue date Jul 30, 2024
- Kioxia Corporation
- Motoko Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinting method and imprinting apparatus
- Patent number 11,899,360
- Issue date Feb 13, 2024
- Kioxia Corporation
- Masaki Mitsuyasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint apparatus, imprint method, and method of manufacturing semi...
- Patent number 11,837,469
- Issue date Dec 5, 2023
- Kioxia Corporation
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, patterning method, and method for manufacturing semicondu...
- Patent number 11,762,285
- Issue date Sep 19, 2023
- Kioxia Corporation
- Anupam Mitra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Template, template manufacturing method, and semiconductor device m...
- Patent number 11,669,011
- Issue date Jun 6, 2023
- Kioxia Corporation
- Jun Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint device, imprint method and method of manufacturing semicond...
- Patent number 11,333,970
- Issue date May 17, 2022
- Kioxia Corporation
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint apparatus, imprint method, and method of manufacturing semi...
- Patent number 11,004,683
- Issue date May 11, 2021
- TOSHIBA MEMORY CORPORATION
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil mask, stencil mask manufacturing method, and imprinting method
- Patent number 10,022,748
- Issue date Jul 17, 2018
- TOSHIBA MEMORY CORPORATION
- Masato Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern accuracy detecting apparatus and processing system
- Patent number 9,941,177
- Issue date Apr 10, 2018
- TOSHIBA MEMORY CORPORATION
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern shape adjustment method, pattern shape adjustment system, e...
- Patent number 9,885,960
- Issue date Feb 6, 2018
- TOSHIBA MEMORY CORPORATION
- Nobuhiro Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask manufacturing equipment and mask manufacturing method
- Patent number 9,817,318
- Issue date Nov 14, 2017
- TOSHIBA MEMORY CORPORATION
- Tetsuya Kugimiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint method and imprint system
- Patent number 9,541,847
- Issue date Jan 10, 2017
- Kabushiki Kaisha Toshiba
- Masato Suzuki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 9,040,358
- Issue date May 26, 2015
- Renesas Electronics Corporation
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,846,455
- Issue date Sep 30, 2014
- Renesas Electronics Corporation
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and pattern forming method
- Patent number 8,778,572
- Issue date Jul 15, 2014
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, pattern forming apparatus, and method for m...
- Patent number 8,772,179
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,679,731
- Issue date Mar 25, 2014
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask manufacturing method and semiconductor device manufacturi...
- Patent number 8,584,054
- Issue date Nov 12, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure determining method, method of manufacturing semiconductor...
- Patent number 8,440,376
- Issue date May 14, 2013
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 8,419,950
- Issue date Apr 16, 2013
- Kabushiki Kaisha Toshiba
- Hiroyuki Kashiwagi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask manufacturing method and semiconductor device manufacturi...
- Patent number 8,407,628
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,384,229
- Issue date Feb 26, 2013
- Renesas Electronics Corporation
- Kazuya Fukuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and production method thereof
- Patent number 8,373,258
- Issue date Feb 12, 2013
- Renesas Electronics Corporation
- Shinya Mizusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus inspection mask and exposure apparatus inspectio...
- Patent number 8,343,692
- Issue date Jan 1, 2013
- Kabushiki Kaisha Toshiba
- Nobuhiro Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inspecting nano-imprint template
- Patent number 8,294,889
- Issue date Oct 23, 2012
- Kabushiki Kaisha Toshiba
- Hiroyuki Kashiwagi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,293,456
- Issue date Oct 23, 2012
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, mask data producing method, and semiconductor devi...
- Patent number 8,142,960
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Satoshi Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correcting method
- Patent number 8,122,385
- Issue date Feb 21, 2012
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device including power supply bar having jutted porti...
- Patent number 8,097,942
- Issue date Jan 17, 2012
- Renesas Electronics Corporation
- Kazuyuki Misumi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240427234
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND METHOD FOR MANUFAC...
- Publication number 20230305387
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Kazuya FUKUHARA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MARK, TEMPLATE, AND SEMICONDCTOR DEVICE MANUFACTURING METHOD
- Publication number 20230092256
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Sachiko Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20220252975
- Publication date Aug 11, 2022
- KIOXIA Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINTING DEVICE, IMPRINTING METHOD, AND METHOD FOR MANUFACTURING...
- Publication number 20220197135
- Publication date Jun 23, 2022
- KIOXIA Corporation
- Motoko SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20210294208
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Anupam MITRA
- B82 - NANO-TECHNOLOGY
Information Patent Application
TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...
- Publication number 20210294209
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Jun WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20210225638
- Publication date Jul 22, 2021
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINTING METHOD AND IMPRINTING APPARATUS
- Publication number 20210072638
- Publication date Mar 11, 2021
- KIOXIA Corporation
- Masaki MITSUYASU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT TEMPLATES, METHOD FOR MANUFACTURING IMPRINT TEMPLATES, AND...
- Publication number 20200249567
- Publication date Aug 6, 2020
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT DEVICE, IMPRINT METHOD AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20200081338
- Publication date Mar 12, 2020
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING POWER SEMIC...
- Publication number 20190343015
- Publication date Nov 7, 2019
- MITSUBISHI ELECTRIC CORPORATION
- Noriyuki BESSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...
- Publication number 20190221421
- Publication date Jul 18, 2019
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20190079391
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND IMPRINT METHOD
- Publication number 20190079390
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM
- Publication number 20170271214
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Kentaro KASA
- G01 - MEASURING TESTING
Information Patent Application
STENCIL MASK, STENCIL MASK MANUFACTURING METHOD, AND IMPRINTING METHOD
- Publication number 20160076132
- Publication date Mar 17, 2016
- Kabushiki Kaisha Toshiba
- Masato SUZUKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MASK MANUFACTURING EQUIPMENT AND MASK MANUFACTURING METHOD
- Publication number 20150268562
- Publication date Sep 24, 2015
- KABUSHIKI KAISHA TOSHIBA
- Tetsuya KUGIMIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150235926
- Publication date Aug 20, 2015
- RENESAS ELECTRONICS CORPORATION
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN SHAPE ADJUSTMENT METHOD, PATTERN SHAPE ADJUSTMENT SYSTEM, E...
- Publication number 20150183059
- Publication date Jul 2, 2015
- KABUSHIKI KAISHA TOSHIBA
- Nobuhiro Komine
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20140363926
- Publication date Dec 11, 2014
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK AND PATTERN FORMING METHOD
- Publication number 20130244141
- Publication date Sep 19, 2013
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND METHOD FOR M...
- Publication number 20130217155
- Publication date Aug 22, 2013
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20130179846
- Publication date Jul 11, 2013
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130171776
- Publication date Jul 4, 2013
- RENESAS ELECTRONICS CORPORATION
- Kazuya FUKUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT METHOD AND IMPRINT SYSTEM
- Publication number 20130020741
- Publication date Jan 24, 2013
- Masato SUZUKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120328992
- Publication date Dec 27, 2012
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER-READABLE RECORDING MEDIUM RECORDING EXPOSING CONDITION DET...
- Publication number 20120206702
- Publication date Aug 16, 2012
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DETERMINATION METHOD, EXPOSURE METHOD, AND SEMICONDUCTOR DEVIC...
- Publication number 20120163699
- Publication date Jun 28, 2012
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120070985
- Publication date Mar 22, 2012
- Takaki Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazuya Fukuhara

Person

Patents Grantslast 30 patents

Imprint apparatus and imprint method

Imprinting device, imprinting method, and method for manufacturing...

Imprinting method and imprinting apparatus

Imprint apparatus, imprint method, and method of manufacturing semi...

Template, patterning method, and method for manufacturing semicondu...

Template, template manufacturing method, and semiconductor device m...

Imprint device, imprint method and method of manufacturing semicond...

Imprint apparatus, imprint method, and method of manufacturing semi...

Stencil mask, stencil mask manufacturing method, and imprinting method

Pattern accuracy detecting apparatus and processing system

Pattern shape adjustment method, pattern shape adjustment system, e...

Mask manufacturing equipment and mask manufacturing method

Imprint method and imprint system

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Photomask and pattern forming method

Pattern forming method, pattern forming apparatus, and method for m...

Semiconductor device manufacturing method

Photomask manufacturing method and semiconductor device manufacturi...

Exposure determining method, method of manufacturing semiconductor...

Pattern forming method

Photomask manufacturing method and semiconductor device manufacturi...

Semiconductor device and method for manufacturing the same

Semiconductor device and production method thereof

Exposure apparatus inspection mask and exposure apparatus inspectio...

Method for inspecting nano-imprint template

Semiconductor device manufacturing method

Exposure method, mask data producing method, and semiconductor devi...

Mask pattern correcting method

Semiconductor device including power supply bar having jutted porti...

Patents Applicationslast 30 patents

IMPRINT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND METHOD FOR MANUFAC...

MARK, TEMPLATE, AND SEMICONDCTOR DEVICE MANUFACTURING METHOD

IMPRINT APPARATUS AND IMPRINT METHOD

IMPRINTING DEVICE, IMPRINTING METHOD, AND METHOD FOR MANUFACTURING...

TEMPLATE, PATTERNING METHOD, AND METHOD FOR MANUFACTURING SEMICONDU...

TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...

IMPRINTING METHOD AND IMPRINTING APPARATUS

IMPRINT TEMPLATES, METHOD FOR MANUFACTURING IMPRINT TEMPLATES, AND...

IMPRINT DEVICE, IMPRINT METHOD AND METHOD OF MANUFACTURING SEMICOND...

POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING POWER SEMIC...

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMI...

IMPRINT APPARATUS AND IMPRINT METHOD

IMPRINT APPARATUS AND IMPRINT METHOD

PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM

STENCIL MASK, STENCIL MASK MANUFACTURING METHOD, AND IMPRINTING METHOD

MASK MANUFACTURING EQUIPMENT AND MASK MANUFACTURING METHOD

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PATTERN SHAPE ADJUSTMENT METHOD, PATTERN SHAPE ADJUSTMENT SYSTEM, E...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PHOTOMASK AND PATTERN FORMING METHOD

PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND METHOD FOR M...

PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURI...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

IMPRINT METHOD AND IMPRINT SYSTEM

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

COMPUTER-READABLE RECORDING MEDIUM RECORDING EXPOSING CONDITION DET...

MASK DETERMINATION METHOD, EXPOSURE METHOD, AND SEMICONDUCTOR DEVIC...

EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE