Kazuya Honda

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generator, chemically amplified resist composition, and p...
- Patent number 11,022,881
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Kazuya Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic dianhydride, polyimide resin and method for produci...
- Patent number 10,919,918
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,323,113
- Issue date Jun 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium compound, resist composition, and pattern forming process
- Patent number 10,173,975
- Issue date Jan 8, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD,...
- Publication number 20250068070
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...
- Publication number 20210317268
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...
- Publication number 20210317270
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20200326624
- Publication date Oct 15, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200102271
- Publication date Apr 2, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...
- Publication number 20200041903
- Publication date Feb 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
- Publication number 20190324367
- Publication date Oct 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kazuya Honda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...
- Publication number 20190169211
- Publication date Jun 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20180099928
- Publication date Apr 12, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G01 - MEASURING TESTING
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20170369616
- Publication date Dec 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Kazuya Honda

Person

Patents Grantslast 30 patents

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Compound, polyimide resin and method of producing the same, photose...

Polymer, photosensitive resin composition, patterning method, metho...

Photoacid generator, chemically amplified resist composition, and p...

Tetracarboxylic dianhydride, polyimide resin and method for produci...

Resist composition and patterning process

Sulfonium compound, resist composition, and pattern forming process

Patents Applicationslast 30 patents

NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD,...

POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...

NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...

NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...

SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS