Kazuya Kamon

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Simulator for a chemical mechanical polishing
- Patent number 7,363,207
- Issue date Apr 22, 2008
- Renesas Technology Corp.
- Kazuya Kamon
- B24 - GRINDING POLISHING
Information Patent Grant
Layout data saving method, layout data converting device and graphi...
- Patent number 7,213,217
- Issue date May 1, 2007
- Renesas Technology Corp.
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection aligner, aberration estimating mask pattern, aberration...
- Patent number 7,170,682
- Issue date Jan 30, 2007
- Renesas Technology Corp.
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Mask data processor
- Patent number 7,020,866
- Issue date Mar 28, 2006
- Renesas Technology Corp.
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection aligner, aberration estimating mask pattern, aberration...
- Patent number 6,970,291
- Issue date Nov 29, 2005
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Layout data saving method, layout data converting device and graphi...
- Patent number 6,951,004
- Issue date Sep 27, 2005
- Renesas Technology Corp.
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
MASK DATA CORRECTION APPARATUS, FOURIER TRANSFORMATION APPARATUS, U...
- Patent number 6,831,997
- Issue date Dec 14, 2004
- Renesas Technology Corp.
- Kazuya Kamon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask, fabrication method of photomask, and fabrication method...
- Patent number 6,737,198
- Issue date May 18, 2004
- Renesas Technology Corp.
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aberration estimating mask pattern
- Patent number 6,517,983
- Issue date Feb 11, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Method of forming a pattern using proximity-effect-correction
- Patent number 6,453,274
- Issue date Sep 17, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection aligner, aberration estimating mask pattern, aberration...
- Patent number 6,245,470
- Issue date Jun 12, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Photomask method of manufacture method of test/repair and method of...
- Patent number 6,228,542
- Issue date May 8, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projecting printing apparatus, projection printing method, mask pat...
- Patent number 6,061,188
- Issue date May 9, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for correcting light proximity effects by pred...
- Patent number 5,815,685
- Issue date Sep 29, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reflection Photomask
- Patent number 5,538,818
- Issue date Jul 23, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,524,039
- Issue date Jun 4, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Mask inspecting method and mask detector
- Patent number 5,481,624
- Issue date Jan 2, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask comprising an optical path adjusting film
- Patent number 5,455,130
- Issue date Oct 3, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and polarizer
- Patent number 5,436,761
- Issue date Jul 25, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Photomask and method of manufacturing the same
- Patent number 5,422,206
- Issue date Jun 6, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method
- Patent number 5,418,599
- Issue date May 23, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and aligning method using the same
- Patent number 5,406,373
- Issue date Apr 11, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus employing a photomask
- Patent number 5,393,623
- Issue date Feb 28, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical pattern projecting apparatus
- Patent number 5,382,999
- Issue date Jan 17, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and an exposure method using the same
- Patent number 5,369,464
- Issue date Nov 29, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposing apparatus and projection exposing method
- Patent number 5,367,358
- Issue date Nov 22, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,365,371
- Issue date Nov 15, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Grant
Apparatus and method for evaluating a projection lens
- Patent number 5,321,493
- Issue date Jun 14, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,317,450
- Issue date May 31, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection aligner
- Patent number 5,315,349
- Issue date May 24, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Projection aligner, aberration estimating mask pattern, aberration...
- Publication number 20060023309
- Publication date Feb 2, 2006
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Application
Layout data saving method, layout data converting device and graphi...
- Publication number 20050268270
- Publication date Dec 1, 2005
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Simulator for a chemical mechanical polishing
- Publication number 20040167755
- Publication date Aug 26, 2004
- RENESAS TECHNOLOGY CORP.
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask data processor
- Publication number 20040060033
- Publication date Mar 25, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Layout data saving method, layout data converting device and graphi...
- Publication number 20040031006
- Publication date Feb 12, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Projection aligner, aberration estimating mask pattern,aberration q...
- Publication number 20030123038
- Publication date Jul 3, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS
Information Patent Application
Mask data correction apparatus, fourier transformation apparatus, u...
- Publication number 20020018599
- Publication date Feb 14, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A PATTERN USING PROXIMITY-EFFECT-CORRECTION
- Publication number 20010053964
- Publication date Dec 20, 2001
- KAZUYA KAMON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK, FABRICATION METHOD OF PHOTOMASK, AND FABRICATION METHOD...
- Publication number 20010049062
- Publication date Dec 6, 2001
- KAZUYA KAMON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection aligner, aberration estimating mask pattern, aberration...
- Publication number 20010010886
- Publication date Aug 2, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Kazuya Kamon
- G02 - OPTICS

Kazuya Kamon

Person

Patents Grantslast 30 patents

Simulator for a chemical mechanical polishing

Layout data saving method, layout data converting device and graphi...

Projection aligner, aberration estimating mask pattern, aberration...

Mask data processor

Projection aligner, aberration estimating mask pattern, aberration...

Layout data saving method, layout data converting device and graphi...

MASK DATA CORRECTION APPARATUS, FOURIER TRANSFORMATION APPARATUS, U...

Photomask, fabrication method of photomask, and fabrication method...

Aberration estimating mask pattern

Method of forming a pattern using proximity-effect-correction

Projection aligner, aberration estimating mask pattern, aberration...

Photomask method of manufacture method of test/repair and method of...

Projecting printing apparatus, projection printing method, mask pat...

Apparatus and method for correcting light proximity effects by pred...

Reflection Photomask

Projection exposure apparatus

Mask inspecting method and mask detector

Photomask comprising an optical path adjusting film

Projection exposure apparatus and polarizer

Photomask and method of manufacturing the same

Exposure method

Alignment mark and aligning method using the same

Exposure apparatus employing a photomask

Optical pattern projecting apparatus

Exposure apparatus and an exposure method using the same

Projection exposing apparatus and projection exposing method

Projection exposure apparatus

Apparatus and method for evaluating a projection lens

Projection exposure apparatus

Projection aligner

Patents Applicationslast 30 patents

Projection aligner, aberration estimating mask pattern, aberration...

Layout data saving method, layout data converting device and graphi...

Simulator for a chemical mechanical polishing

Mask data processor

Layout data saving method, layout data converting device and graphi...

Projection aligner, aberration estimating mask pattern,aberration q...

Mask data correction apparatus, fourier transformation apparatus, u...

METHOD OF FORMING A PATTERN USING PROXIMITY-EFFECT-CORRECTION

PHOTOMASK, FABRICATION METHOD OF PHOTOMASK, AND FABRICATION METHOD...

Projection aligner, aberration estimating mask pattern, aberration...