Kazuya Kikuchi

Person

Moriguchi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor devices
- Patent number 5,236,851
- Issue date Aug 17, 1993
- Matsushita Electric Industrial Co., Ltd.
- Shuichi Kameyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device by forming doped regions...
- Patent number 5,183,768
- Issue date Feb 2, 1993
- Matsushita Electric Industrial Co., Ltd.
- Shuichi Kameyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating bipolar semiconductor devices
- Patent number 5,116,770
- Issue date May 26, 1992
- Matsushita Electric Industrial Co., Ltd.
- Shuichi Kameyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 5,045,493
- Issue date Sep 3, 1991
- Matsushita Electric Ind., Ltd.
- Shuichi Kameyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit and its manufacturing method
- Patent number 4,910,575
- Issue date Mar 20, 1990
- Matsushita Electric Industrial Co., Ltd.
- Tadao Komeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of semiconductor device
- Patent number 4,693,782
- Issue date Sep 15, 1987
- Matsushita Electric Industrial Co., Ltd.
- Kazuya Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pretreatment of photoresist masking layers resulting in higher temp...
- Patent number 4,253,888
- Issue date Mar 3, 1981
- Matsushita Electric Industrial Co., Ltd.
- Kazuya Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS

Kazuya Kikuchi

Person

Patents Grantslast 30 patents

Method for fabricating semiconductor devices

Method of fabricating semiconductor device by forming doped regions...

Method for fabricating bipolar semiconductor devices

Semiconductor device and method of manufacturing the same

Semiconductor integrated circuit and its manufacturing method

Fabrication method of semiconductor device

Pretreatment of photoresist masking layers resulting in higher temp...