Kazuya NAGASEKI

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Part transporting device and processing system
- Patent number 12,186,898
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Kazuki Moyama
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,033,832
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of component and substrate processing system
- Patent number 11,981,993
- Issue date May 14, 2024
- Tokyo Electron Limited
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and method for manufacturing part having fil...
- Patent number 11,919,032
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Takayuki Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 11,699,573
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method using transporting device facilitating...
- Patent number 11,613,432
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Kazuki Moyama
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 11,450,515
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode and plasma processing apparatus
- Patent number 11,443,924
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for plasma processing
- Patent number 11,393,662
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,387,077
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,315,793
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust device for processing apparatus provided with multiple blades
- Patent number 11,315,770
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing electrostatic chuck and electrostsatic chuck
- Patent number 11,227,786
- Issue date Jan 18, 2022
- Tokyo Electron Limited
- Satoshi Taga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,170,979
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses having a dielectric injector
- Patent number 11,152,194
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and plasma processing method
- Patent number 11,107,663
- Issue date Aug 31, 2021
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,043,389
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,135
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,825,663
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Kazuya Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 10,763,126
- Issue date Sep 1, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,553,407
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,978,566
- Issue date May 22, 2018
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,390,943
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, focus ring heating method, and subs...
- Patent number 8,941,037
- Issue date Jan 27, 2015
- Tokyo Electron Limited
- Daisuke Hayashi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Etching method of multilayer film
- Patent number 8,895,454
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching unit
- Patent number 8,840,753
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method, and program and storage...
- Patent number 8,821,683
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Yusuke Hirayama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESTORING METHOD OF CONSUMED COMPONENT
- Publication number 20240254620
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...
- Publication number 20240207882
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213000
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240194459
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...
- Publication number 20240096608
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...
- Publication number 20240068921
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Satoru TERUUCHI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220301825
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SYSTEM
- Publication number 20220223427
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...
- Publication number 20220062943
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210391153
- Publication date Dec 16, 2021
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210375592
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20210366691
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20210366697
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...
- Publication number 20210319988
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD
- Publication number 20210296102
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND PART REPLACEMENT METHOD
- Publication number 20210269258
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PART TRANSPORTING DEVICE AND PROCESSING SYSTEM
- Publication number 20210268670
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210159049
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER, MANUFACTURING METHOD OF MEMBER AND SUBSTRATE PROCESSING APP...
- Publication number 20210111005
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Takayuki Ishii
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
TRANSFER METHOD AND TRANSFER APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
- Publication number 20210050240
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210013015
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200373166
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365369
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365372
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20200357658
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200312623
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20200234930
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200144031
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS

Kazuya NAGASEKI

Person

Patents Grantslast 30 patents

Part transporting device and processing system

Etching apparatus and etching method

Plasma processing apparatus and system

Plasma processing method and plasma processing apparatus

Forming method of component and substrate processing system

Forming method of component and plasma processing apparatus

Film forming apparatus and method for manufacturing part having fil...

Plasma processing method

Processing system and method using transporting device facilitating...

Plasma processing apparatus

Upper electrode and plasma processing apparatus

Apparatuses and methods for plasma processing

Plasma processing method and plasma processing apparatus

Etching method and plasma processing apparatus

Exhaust device for processing apparatus provided with multiple blades

Method of manufacturing electrostatic chuck and electrostsatic chuck

Plasma etching method and plasma etching apparatus

Plasma processing apparatuses having a dielectric injector

Plasma processing system and plasma processing method

Substrate processing method

Substrate processing method and substrate processing apparatus

Plasma processing apparatus

Etching apparatus and etching method

Plasma processing method and plasma processing apparatus

Plasma etching method

Substrate processing apparatus

Substrate processing apparatus, focus ring heating method, and subs...

Etching method of multilayer film

Plasma etching unit

Substrate processing apparatus and method, and program and storage...

Patents Applicationslast 30 patents

RESTORING METHOD OF CONSUMED COMPONENT

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...

PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING...

PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITOR...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SYSTEM

FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FIL...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

STAGE AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

FORMING METHOD OF COMPONENT AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...

EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD

PROCESSING SYSTEM AND PART REPLACEMENT METHOD

PART TRANSPORTING DEVICE AND PROCESSING SYSTEM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

MEMBER, MANUFACTURING METHOD OF MEMBER AND SUBSTRATE PROCESSING APP...

TRANSFER METHOD AND TRANSFER APPARATUS FOR SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

APPARATUSES AND METHODS FOR PLASMA PROCESSING

APPARATUSES AND METHODS FOR PLASMA PROCESSING

ETCHING APPARATUS AND ETCHING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS