Kazuya SAKAI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Flight management system
- Patent number 11,308,813
- Issue date Apr 19, 2022
- The University of Tokyo
- Christopher Thomas Raabe
- G08 - SIGNALLING
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,942,442
- Issue date Mar 9, 2021
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,539,866
- Issue date Jan 21, 2020
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 10,495,966
- Issue date Dec 3, 2019
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase-shift mask, method of manufacturing mask blank, m...
- Patent number 10,180,622
- Issue date Jan 15, 2019
- Hoya Corporation
- Hiroaki Shishido
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 9,625,805
- Issue date Apr 18, 2017
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase-shift mask, and method for manufacturing the same
- Patent number 9,625,806
- Issue date Apr 18, 2017
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method of manufacturing the same, transfer mask, and me...
- Patent number 9,535,320
- Issue date Jan 3, 2017
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, method of manufacturing the same, and phase...
- Patent number 9,436,079
- Issue date Sep 6, 2016
- Hoya Corporation
- Osamu Nozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank, method of manufacturing the same, and transfer mask
- Patent number 9,104,112
- Issue date Aug 11, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method of manufacturing the same, transfer mask, and me...
- Patent number 9,091,934
- Issue date Jul 28, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 9,075,315
- Issue date Jul 7, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, transfer mask, method of manufacturing transfer mask an...
- Patent number 9,029,048
- Issue date May 12, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, method of manufacturing the same, and phase...
- Patent number 8,999,609
- Issue date Apr 7, 2015
- Hoya Corporation
- Osamu Nozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank, transfer mask, and film denseness evaluation method
- Patent number 8,709,681
- Issue date Apr 29, 2014
- Hoya Corporation
- Osamu Nozawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Transfer mask, method of manufacturing a transfer mask, and method...
- Patent number 8,658,334
- Issue date Feb 25, 2014
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin film evaluation method, mask blank, and transfer mask
- Patent number 8,609,307
- Issue date Dec 17, 2013
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank manufacturing method, transfer mask manufacturing method...
- Patent number 8,535,855
- Issue date Sep 17, 2013
- Hoya Corporation
- Kazuya Sakai
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Thin film evaluation method, mask blank, and transfer mask
- Patent number 8,450,030
- Issue date May 28, 2013
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank manufacturing method and photomask manufacturing me...
- Patent number 8,221,941
- Issue date Jul 17, 2012
- Hoya Corporation
- Toshiyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing transfer mask and method of manufacturing s...
- Patent number 8,197,993
- Issue date Jun 12, 2012
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLOW TYPE REACTION DEVICE
- Publication number 20210016242
- Publication date Jan 21, 2021
- Taiyo Nippon Sanso Corporation
- Kazuya SAKAI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
FLIGHT MANAGEMENT SYSTEM
- Publication number 20210005091
- Publication date Jan 7, 2021
- THE UNIVERSITY OF TOKYO
- Christopher Thomas RAABE
- G08 - SIGNALLING
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20200064727
- Publication date Feb 27, 2020
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20190146327
- Publication date May 16, 2019
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, METHOD OF MANUFACTURING MASK BLANK, M...
- Publication number 20170176848
- Publication date Jun 22, 2017
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150338731
- Publication date Nov 26, 2015
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING THE SAME, TRANSFER MASK, AND ME...
- Publication number 20150286132
- Publication date Oct 8, 2015
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20150261083
- Publication date Sep 17, 2015
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND PHASE...
- Publication number 20150168823
- Publication date Jun 18, 2015
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING THE SAME, TRANSFER MASK, AND ME...
- Publication number 20130273738
- Publication date Oct 17, 2013
- HOYA CORPORATION
- Kazuya Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK
- Publication number 20130236819
- Publication date Sep 12, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND TRANSFER MASK
- Publication number 20130177841
- Publication date Jul 11, 2013
- HOYA CORPORATION
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...
- Publication number 20130078553
- Publication date Mar 28, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20130078554
- Publication date Mar 28, 2013
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND PHASE...
- Publication number 20130071777
- Publication date Mar 21, 2013
- HOYA CORPORATION
- Osamu Nozawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD...
- Publication number 20120251931
- Publication date Oct 4, 2012
- HOYA CORPORATION
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND FILM DENSITY EVALUATION METHOD
- Publication number 20120034434
- Publication date Feb 9, 2012
- HOYA CORPORATION
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK MANUFACTURING METHOD, TRANSFER MASK MANUFACTURING METHOD...
- Publication number 20110287346
- Publication date Nov 24, 2011
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK
- Publication number 20110287347
- Publication date Nov 24, 2011
- HOYA CORPORATION
- Kazuya SAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING S...
- Publication number 20110217635
- Publication date Sep 8, 2011
- HOYA CORPORATION
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING ME...
- Publication number 20100167185
- Publication date Jul 1, 2010
- HOYA CORPORATION
- Toshiyuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazuya SAKAI

Person

Patents Grantslast 30 patents

Flight management system

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, phase-shift mask, method of manufacturing mask blank, m...

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank, phase-shift mask, and method for manufacturing the same

Mask blank, method of manufacturing the same, transfer mask, and me...

Phase shift mask blank, method of manufacturing the same, and phase...

Mask blank, method of manufacturing the same, and transfer mask

Mask blank, method of manufacturing the same, transfer mask, and me...

Reflective mask blank, reflective mask and method of manufacturing...

Mask blank, transfer mask, method of manufacturing transfer mask an...

Phase shift mask blank, method of manufacturing the same, and phase...

Mask blank, transfer mask, and film denseness evaluation method

Transfer mask, method of manufacturing a transfer mask, and method...

Thin film evaluation method, mask blank, and transfer mask

Mask blank manufacturing method, transfer mask manufacturing method...

Thin film evaluation method, mask blank, and transfer mask

Photomask blank manufacturing method and photomask manufacturing me...

Method of manufacturing transfer mask and method of manufacturing s...

Patents Applicationslast 30 patents

FLOW TYPE REACTION DEVICE

FLIGHT MANAGEMENT SYSTEM

MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE-SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE-SHIFT MASK, METHOD OF MANUFACTURING MASK BLANK, M...

MASK BLANK, PHASE-SHIFT MASK, AND METHOD FOR MANUFACTURING THE SAME

MASK BLANK, METHOD OF MANUFACTURING THE SAME, TRANSFER MASK, AND ME...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

PHASE SHIFT MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND PHASE...

MASK BLANK, METHOD OF MANUFACTURING THE SAME, TRANSFER MASK, AND ME...

THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK

MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND TRANSFER MASK

MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING TRANSFER MASK AN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

PHASE SHIFT MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND PHASE...

TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD...

MASK BLANK, TRANSFER MASK, AND FILM DENSITY EVALUATION METHOD

MASK BLANK MANUFACTURING METHOD, TRANSFER MASK MANUFACTURING METHOD...

THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK

METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING S...

PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING ME...